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Last edited by LC Bot
November 4, 2011 | History
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Angela Duparré

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  • Cover of: Advanced characterization techniques for optics, semiconductors, and nanotechnologies: 3-5 August 2003, San Diego, California, USA

    First published in 2003 — 2 editions
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  • Cover of: Optical fabrication, testing and metrology III: 2-4 September 2008. Glasgow, United Kingdom

    First published in 2008 — 2 editions
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  • Cover of: Advanced characterization techniques for optical, semiconductor, and data storage components: 9-11 July 2002, Seattle, Washington, USA

    First published in 2002 — 1 edition
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  • Cover of: Advanced characterization techniques for optics, semiconductors, and nanotechnologies III: 28-29 August 2007, San Diego, California, USA

    First published in 2007 — 1 edition
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  • Cover of: Optical metrology roadmap for the semiconductor, optical, and data storage industries II: 2-3 August, 2001, San Diego, USA

    First published in 2001 — 1 edition
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  • Cover of: Optical metrology roadmap for the semiconductor, optical, and data storage industries: 30-31 July 2000, San Diego, USA

    First published in 2000 — 1 edition
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Subjects

Congresses, Optical measurements, Optoelectronic devices, Optoelectronics, Characterization, Measurement, Semiconductors, Industrial applications, Information retrieval, Metrology, Nanotechnology, Optical materials, Optical properties, Surfaces (Technology), Technological innovations, Thin films, Design and construction, Information storage and retrieval systems, Interferometry, Optical instruments, Testing

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ID Numbers

  • OLID: OL7031567A

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History

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November 4, 2011 Created by LC Bot import new book