An edition of Advances in Low Temperature RF Plasmas. Basis for Process Design
(2002)
Advances in Low Temperature RF Plasmas. Basis for Process Design
1st edition
by T. Makabe
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Advances in Low Temperature RF Plasmas. Basis for Process Design
May 1, 2002, Elsevier Publishing Company
Hardcover
in English
- 1st edition
0444510958 9780444510952
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- Created April 30, 2008
- 6 revisions
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| December 5, 2020 | Edited by MARC Bot | import existing book |
| April 24, 2010 | Edited by Open Library Bot | Fixed duplicate goodreads IDs. |
| April 16, 2010 | Edited by bgimpertBot | Added goodreads ID. |
| April 13, 2010 | Edited by Open Library Bot | Linked existing covers to the edition. |
| April 30, 2008 | Created by an anonymous user | Imported from amazon.com record |