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Subjects
Integrated circuits, Masks, Optical measurementsShowing 2 featured editions. View all 2 editions?
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1
Interlaboratory study on linewidth measurements for antireflective chromium photomasks
1982, U.S. Dept. of Commerce, National Bureau of Standards, For sale by the Supt. of Docs., U.S. G.P.O.
in English
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2
Interlaboratory study on linewidth measurements for antireflective chromium photomasks
1982, National Bureau of Standards
in English
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Book Details
Edition Notes
Sponsored jointly by NBS and the Defense Advanced Research Projects Agency, Arlington, VA.
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- Created October 20, 2008
- 2 revisions
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October 20, 2008 | Created by ImportBot | Imported from Talis record |