An edition of Alternative lithographic technologies II (2010)

Alternative lithographic technologies II

23-25 February 2010, San Jose, California, United States

by

Alternative lithographic technologies II
Daniel J. C. Herr, Daniel J. C ...
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Last edited by MARC Bot
September 24, 2020 | History
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An edition of Alternative lithographic technologies II (2010)

Alternative lithographic technologies II

23-25 February 2010, San Jose, California, United States

by

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Publish Date
Publisher
SPIE
Language
English

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Subjects

Electron beam Lithography, Congresses, Microlithography, Masks (Electronics), Industrial applications, Extreme ultraviolet lithography

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Edition Availability
Cover of: Alternative lithographic technologies II
Alternative lithographic technologies II: 23-25 February 2010, San Jose, California, United States
2010, SPIE
in English
  • Not in Library
Libraries near you: WorldCat

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Book Details

Edition Notes

Includes bibliographical references.

Published in
Bellingham, Wash
Series
Proceedings of SPIE -- v. 7637, Proceedings of SPIE--the International Society for Optical Engineering -- v. 7637.
Other Titles
Alternative lithographic technologies 2, Alternative lithographic technologies two

Classifications

Library of Congress
TK7872.M3 A482 2010

The Physical Object

Pagination
1 v. (various pagings) :

ID Numbers

Open Library
OL24482937M
ISBN 10
0819480517
ISBN 13
9780819480514
LCCN
2010459490
OCLC/WorldCat
659783697

Source records

Library of Congress MARC record
Library of Congress MARC record

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History

Download catalog record: RDF / JSON / OPDS | Wikipedia citation
September 24, 2020 Edited by MARC Bot import existing book
December 1, 2010 Created by ImportBot Imported from Library of Congress MARC record