An edition of Optical microlithography XXII (2009)

Optical microlithography XXII

24-27 February 2009, San Jose, California, United States

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Optical microlithography XXII
Harry J. Levinson, Mircea V. D ...
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Last edited by MARC Bot
October 17, 2020 | History
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An edition of Optical microlithography XXII (2009)

Optical microlithography XXII

24-27 February 2009, San Jose, California, United States

by and

  • 0 Ratings
  • 0 Want to read
  • 0 Currently reading
  • 0 Have read

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Publish Date
Publisher
SPIE
Language
English

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Subjects
Integrated circuits, Congresses, Masks, X-ray lithography, Microlithography, Manufacturing processes

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Edition Availability
Cover of: Optical microlithography XXII
Optical microlithography XXII: 24-27 February 2009, San Jose, California, United States
2009, SPIE
in English
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Libraries near you: WorldCat

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Book Details

Edition Notes

Includes bibliographical references and author index.

Published in
Bellingham, Wash
Series
Proceedings of SPIE -- v. 7274, Proceedings of SPIE--the International Society for Optical Engineering -- v. 7274.

Classifications

Library of Congress
TK7835 .O6652 2009

The Physical Object

Pagination
2 v. :

ID Numbers

Open Library
OL25081891M
ISBN 10
0819475270
ISBN 13
9780819475275
LCCN
2011499390
OCLC/WorldCat
325000265

Source records

Library of Congress MARC record
Library of Congress MARC record

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History

Download catalog record: RDF / JSON / OPDS | Wikipedia citation
October 17, 2020 Edited by MARC Bot import existing book
October 27, 2011 Edited by LC Bot import new book
October 27, 2011 Created by LC Bot Imported from Library of Congress MARC record