An edition of Alternative lithographic technologies III (2011)

Alternative lithographic technologies III

1-3 March 2011, San Jose, California, United States

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Alternative lithographic technologies III
Daniel J. C. Herr
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Last edited by MARC Bot
November 13, 2020 | History
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An edition of Alternative lithographic technologies III (2011)

Alternative lithographic technologies III

1-3 March 2011, San Jose, California, United States

by

  • 0 Ratings
  • 0 Want to read
  • 0 Currently reading
  • 0 Have read

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Publish Date
Publisher
SPIE
Language
English

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Subjects
Electron beam Lithography, Congresses, Microlithography, Masks (Electronics), Industrial applications, Extreme ultraviolet lithography

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Edition Availability
Cover of: Alternative lithographic technologies III
Alternative lithographic technologies III: 1-3 March 2011, San Jose, California, United States
2011, SPIE
in English
  • Not in Library
Libraries near you: WorldCat

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Book Details

Edition Notes

"SPIE Advanced Lithography" --cover.

Includes bibliographical references and author index.

Published in
Bellingham, Wash
Series
Proceedings of SPIE -- v. 7970, Proceedings of SPIE--the International Society for Optical Engineering -- v. 7970.
Other Titles
Alternative lithographic technologies 3, Alternative lithographic technologies three

Classifications

Library of Congress
TK7872.M3 A483 2011

The Physical Object

Pagination
1 v. (various pagings) :

ID Numbers

Open Library
OL25284167M
ISBN 10
0819485292
ISBN 13
9780819485298
LCCN
2012360952
OCLC/WorldCat
751794121

Source records

Library of Congress MARC record
Library of Congress MARC record

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History

Download catalog record: RDF / JSON / OPDS | Wikipedia citation
November 13, 2020 Edited by MARC Bot import existing book
April 18, 2012 Created by LC Bot Imported from Library of Congress MARC record