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Precursor chemistry of advanced materials: CVD, ALD and nanoparticles
2010, Springer
in English
3642056881 9783642056888
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Table of Contents
Gas-phase thermochemistry and mechanism of organometallic tin oxide CVD precursors / M.D. Allendorf ... [et al.]
Materials chemistry of group 13 nitrides / A. Devi ... [et al.]
Single-source-precursor CVD: Alkoxy and siloxy aluminum hydrides / M. Veith
CVD deposition of binary AlSb and GaSb material films
a single-source approach / S. Schulz
Organometallic precursors for atomic layer deposition / M. Putkonen ... [et al.]
Surface reactivity of transition metal CVD precursors: Towards the control of the nucleation step / P. Serp ... [et al.]
Organometallic and metallo-organic precursors for nanoparticles / M.A. Malik ... [et al.].
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Includes bibliographical references and index.
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- Created July 28, 2014
- 4 revisions
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October 9, 2020 | Edited by ImportBot | import existing book |
August 2, 2020 | Edited by ImportBot | import existing book |
May 23, 2020 | Edited by CoverBot | Added new cover |
July 28, 2014 | Created by ImportBot | Imported from Internet Archive item record |