An edition of Optical and dimensional-measurement problems with photomasking in microelectronics (1975)

Optical and dimensional-measurement problems with photomasking in microelectronics

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Optical and dimensional-measurement problems ...
John M. Jerke
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Last edited by MARC Bot
July 12, 2024 | History
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An edition of Optical and dimensional-measurement problems with photomasking in microelectronics (1975)

Optical and dimensional-measurement problems with photomasking in microelectronics

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  • 0 Ratings
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  • 0 Have read

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Publish Date
Publisher
U.S. Dept. of Commerce, National Bureau of Standards : for sale by the Supt. of Docs., U.S. Govt. Print. Off.
Language
English
Pages
36

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Subjects
Integrated circuits, Masks, Optical measurements, Photolithography

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Cover of: Optical and dimensional-measurement problems with photomasking in microelectronics
Optical and dimensional-measurement problems with photomasking in microelectronics
1975, U.S. Dept. of Commerce, National Bureau of Standards : for sale by the Supt. of Docs., U.S. Govt. Print. Off.
in English
  • Not in Library
Libraries near you: WorldCat

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Book Details

Edition Notes

Bibliography: p. 31-36.

Published in
Washington
Series
Semiconductor measurement technology, NBS special publication ; 400-20, NBS special publication ;, 400-20.

Classifications

Dewey Decimal Class
389/.08 s, 621.381/73
Library of Congress
QC100 .U57 no. 400-20, TK7874 .U57 no. 400-20

The Physical Object

Pagination
iv, 36 p. :
Number of pages
36

ID Numbers

Open Library
OL4855493M
LCCN
75619190
OCLC/WorldCat
1528173

Source records

Library of Congress MARC record
marc_columbia MARC record

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History

Download catalog record: RDF / JSON / OPDS | Wikipedia citation
July 12, 2024 Edited by MARC Bot import existing book
October 9, 2020 Edited by MARC Bot import existing book
December 14, 2009 Edited by WorkBot link works
April 1, 2008 Created by an anonymous user Imported from Scriblio MARC record