An edition of Handbook of plasma processing technology
(1990)
Handbook of Plasma Processing Technology
Fundamentals, Etching, Deposition, and Surface Interactions (Materials Science and Process Technology)
by Stephen M. Rossnagel, Jerome J. Cuomo, and William D. Westwood
- 0 Ratings
- 0 Want to read
- 0 Currently reading
- 0 Have read
Share
×Close
This edition doesn't have a description yet. Can you add one?
Check nearby libraries
Buy this book
Previews available in: English
Subjects
Plasma engineering, Semiconductors, Etching, Plasma etchingShowing 2 featured editions. View all 2 editions?
| Edition | Availability |
|---|---|
1
Handbook of Plasma Processing Technology: Fundamental, Etching, Deposition and Surface Interactions
1990, Elsevier Science & Technology Books
in English
0815517645 9780815517641
|
zzzz
Libraries near you:
WorldCat
|
2
Handbook of Plasma Processing Technology: Fundamentals, Etching, Deposition, and Surface Interactions (Materials Science and Process Technology)
January 1, 1990, Noyes Publications
Hardcover
in English
0815512201 9780815512202
|
aaaa
Libraries near you:
WorldCat
|
Book Details
First Sentence
"The driving force for the rapid development of plasma based processing over the past 15 years has been the microelectronics industry and in particular, the fabrication of silicon integrated circuits."
The Physical Object
ID Numbers
Community Reviews (0)
Feedback?
History
- Created April 29, 2008
- 6 revisions
Wikipedia citation
×CloseCopy and paste this code into your Wikipedia page. Need help?
| April 9, 2019 | Edited by MARC Bot | import existing book |
| April 6, 2014 | Edited by ImportBot | Added IA ID. |
| April 24, 2010 | Edited by Open Library Bot | Fixed duplicate goodreads IDs. |
| April 16, 2010 | Edited by bgimpertBot | Added goodreads ID. |
| April 29, 2008 | Created by an anonymous user | Imported from amazon.com record |