Record ID | harvard_bibliographic_metadata/ab.bib.12.20150123.full.mrc:262827604:2301 |
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LEADER: 02301cam a2200505Ia 4500
001 012244939-8
005 20110712022027.0
008 090313s2010 gw a b 001 0 eng d
015 $a993291325$2dnb
020 $a3540887881
020 $a9783540887881
035 0 $aocn315135134
040 $aYDXCP$cYDXCP$dBTCTA$dOHX$dORE$dBWX$dGBVCP
050 4 $aQC1$b.T64 v.116
060 00 $aW1$bTO539E v.116 2010
082 $a620.11
090 $aQC1$b.T64 v.116
245 00 $aMaterials science with ion beams /$cHarry Bernas (ed.).
260 $aBerlin :$bSpringer,$c2010.
300 $axv, 376 p. :$bill. ;$c24 cm.
490 1 $aTopics in applied physics ;$v116
504 $aIncludes bibliographical references and index.
505 0 $aFundamental concepts of Ion-beam processing -- Precipitate and microstructural stability in alloys subjected to sustained irradiation -- Spontaneous patterning of surfaces by low-energy ion beams -- Ion-beam-induced amorphization and epitaxial crystallization of silicon -- Voids and nanocavities in silicon -- Damage formation and evolution in ion-implanted crystalline Si -- Point defect kinetics and extended-defect formation during millisecond processing of ion-implanted silicon -- Magnetic properties and ion beams: why and how -- Structure and properties of nanoparticles formed by ion implantation -- Metal nanoclusters for optical properties -- Ion beams in the geological sciences -- Ion-beam modification of polymer surfaces for biological applications.
650 0 $aIon bombardment.
650 0 $aMaterials science.
650 4 $aIonenimplantation.
650 4 $aIonenstrahlbearbeitung.
650 0 $aPhysics
650 0 $aParticle acceleration
650 0 $aEngineering
650 0 $aOptical materials
650 14 $aPhysics
650 24 $aParticle Acceleration and Detection, Beam Physics
650 24 $aCondensed Matter Physics
650 24 $aEngineering, general
650 24 $aOptical and Electronic Materials
650 2 $aIons.
650 2 $aManufactured Materials.
650 2 $aMicrobiological Techniques$xmethods.
700 1 $aBernas, H.$q(Harry)
830 0 $aTopics in applied physics ;$vv. 116.
830 0 $aTopics in Applied Physics,$x0303-4216 ;$v116
988 $a20100316
049 $aMCSS
906 $0OCLC