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LEADER: 03907nam a22003975a 4500
001 013530387-7
005 20130208190745.0
008 121213s2013 au | s ||0| 0|eng d
020 $a9783211993569
020 $a9783211993569
020 $a9783211993552
024 7 $a10.1007/978-3-211-99356-9$2doi
035 $a(Springer)9783211993569
040 $aSpringer
050 4 $aTA1750-1750.22
072 7 $aTJFD$2bicssc
072 7 $aTEC021000$2bisacsh
072 7 $aTEC008080$2bisacsh
082 04 $a620.11295$223
082 04 $a620.11297$223
100 1 $aSchmidt, Bernd.
245 10 $aIon Beams in Materials Processing and Analysis /$cby Bernd Schmidt, Klaus Wetzig.
260 $aVienna :$bSpringer Vienna :$bImprint: Springer,$c2013.
300 $aIX, 418 p. 96 illus., 65 illus. in color.$bdigital.
505 0 $a<p><b>Preface -- 1. Introduction -- </b><b>2. Ion- Solid Interactions -- </b>2.1 Fundamental Principles -- 2.2 Binary Elastic Collisions -- 2.3 Ion Stopping -- 2.4 Ion Channeling -- 2.5 Ion Induced Target Modifications -- <b>3. Ion Beam Technology -- </b>3.1 Principles of Ion Accelerators -- 3.2 Ion Sources -- 3.3 Ion Acceleration -- 3.4 Ion Beam Handling -- 3.5 Ion Implantation Systems -- 3.6 Electrostatic Ion Accelerator Systems -- 3.7 Focused Ion Beam Systems -- <b>4. Materials Processing -- </b>4.1 Ion Irradiation Effects in Crystalline Materials -- 4.2 Ion Implantation into Semiconductors -- 4.3 Ion Beam Synthesis of New Phases in Solids -- 4.4 Ion Beam Mixing of Interfaces -- 4.5 Ion Beam Slicing of Thin Layers (Smart-Cut for SOI and Solar Cells) -- 4.6 Ion Beam Erosion, Sputtering and Surface Patterning (Ripples and Dots) -- 4.7 Ion Beam Shaping of Nanomaterials -- 4.8 Ion Beam Processing of other Materials -- <b>5. Ion Beam Preparation of Materials -- </b>5.1 Removal of Target Atoms by Sputtering -- 5.2 Effects on Sputtering Yield -- 5.3 Preparation Steps by Ion Beam Irradiation -- 5.4 Focus Ion Beam (FIB) Preparation -- <b>6. Ion Beam Analysis </b><b>by Ion Beams -- </b>6.1 Introduction -- 6.2 Ion Beam Analytical Techniques – a Survey -- 6.3 Ion Beam Scattering Techniques -- 6.4 Ion Beam Induced Photon Emission -- 6.5 Nuclear Reaction Analysis (NRA) -- 6.6 Ion Beam Induced Electron and Light Emission -- 6.7 Secondary Ion Emission -- 6.8 Ion Beam Imaging Techniques -- <b>7. Special Ion Beam Applications in Materials Analysis Problems -- </b>7.1 Functional Thin Films and Layers -- 7.2 Ion Beam Analysis in Art and Archeometry -- 7.3 Special Applications in Life Sciences -- <b>Index.</b></p>.
520 $a<p>A comprehensive review of ion beam application in modern materials research is provided, including the basics of ion beam physics and technology. The physics of ion-solid interactions for ion implantation, ion beam synthesis, sputtering and nano-patterning is treated in detail. Its applications in materials research, development and analysis, developments of special techniques and interaction mechanisms of ion beams with solid state matter result in the optimization of new material properties, which are discussed thoroughly. Solid-state properties optimization for functional materials such as doped semiconductors and metal layers for nano-electronics, metal alloys, and nano-patterned surfaces is demonstrated. The ion beam is an important tool for both materials processing and analysis. Researchers engaged in solid-state physics and materials research, engineers and technologists in the field of modern functional materials will welcome this text.</p>
650 10 $aMaterials science.
650 0 $aElectronics.
650 0 $aOptical materials.
650 24 $aOptical and Electronic Materials.
650 24 $aParticle and Nuclear Physics.
650 24 $aElectronics and Microelectronics, Instrumentation.
700 1 $aWetzig, Klaus.
776 08 $iPrinted edition:$z9783211993552
988 $a20130105
906 $0VEN