| Record ID | harvard_bibliographic_metadata/ab.bib.14.20150123.full.mrc:112433813:981 |
| Source | harvard_bibliographic_metadata |
| Download Link | /show-records/harvard_bibliographic_metadata/ab.bib.14.20150123.full.mrc:112433813:981?format=raw |
LEADER: 00981nam a2200265Ia 4500
001 014082778-1
005 20140605021519.0
008 140528s2012 flua b 000 0 eng d
020 $a9781439849590
035 0 $aocn880637719
040 $aUMI$cUMI$dMH
090 $aTK7871.99.M44$bW664 2012
100 1 $aWong, Hei.
245 10 $aNano-CMOS gate dielectric engineering /$cHei Wong.
260 $aBoca Raton, FL :$bCRC Press,$cc2012.
300 $a1 online resource (xiv, 228 p.) :$bill.
588 $aDescription based on print version record.
504 $aIncludes bibliographical references.
650 0 $aMetal oxide semiconductors, Complementary$xDesign and construction.
650 0 $aDielectrics.
650 0 $aGate array circuits.
650 0 $aNanoelectronics$xMaterials.
776 08 $iPrint version:$aWong, Hei.$tNano-CMOS gate dielectric engineering.$dBoca Raton : CRC Press, 2012$z9781439849590$w(DLC) 2011042789$w(OCoLC)613423659
988 $a20140605
906 $0OCLC