Record ID | ia:chemicaloxidatio0000inte |
Source | Internet Archive |
Download MARC XML | https://archive.org/download/chemicaloxidatio0000inte/chemicaloxidatio0000inte_marc.xml |
Download MARC binary | https://www.archive.org/download/chemicaloxidatio0000inte/chemicaloxidatio0000inte_meta.mrc |
LEADER: 01349cam a22003014a 4500
001 00034232
003 DLC
005 20010217075416.0
008 000503s2000 ohuab b 101 0 eng
010 $a 00034232
020 $a1574771000 (alk. paper)
040 $aDLC$cDLC$dDLC
042 $apcc
050 00 $aTD1066.O73$bI58 2000c
082 00 $a628.1/683$221
111 2 $aInternational Conference on Remediation of Chlorinated and Recalcitrant Compounds$n(2nd :$c2000 :$dMonterey, Calif.)
245 10 $aChemical oxidation and reactive barriers :$bremediation of chlorinated and recalcitrant compounds /$ceditors, Godage B. Wickramanayake, Arun R. Gavaskar, and Abraham S.C. Chen.
260 $aColumbus, Ohio :$bBattelle Press,$cc2000.
300 $ax, 470 p. :$bill., maps ;$c24 cm.
500 $a"The Second International Conference on Remediation of Chlorinated and Recalcitrant Compounds, Monterey, California, May 22-25, 2000."
504 $aIncludes bibliographical references and indexes.
650 0 $aOrganochlorine compounds$xEnvironmental aspects$vCongresses.
650 0 $aOxidation$vCongresses.
650 0 $aIn situ remediation$vCongresses.
650 0 $aHazardous waste site remediation$vCongresses.
700 1 $aWickramanayake, Godage B.,$d1953-
700 1 $aGavaskar, Arun R.,$d1962-
700 1 $aChen, Abraham S. C.,$d1951-