| Record ID | ia:electronbeamxray0632unse |
| Source | Internet Archive |
| Download MARC XML | https://archive.org/download/electronbeamxray0632unse/electronbeamxray0632unse_marc.xml |
| Download MARC binary | https://www.archive.org/download/electronbeamxray0632unse/electronbeamxray0632unse_meta.mrc |
LEADER: 01654cam a2200361 a 4500
001 409969
005 20220519014910.0
008 860930t19861986waua b 101 0 eng d
010 $a 86061034
020 $a089252667X
035 $a(OCoLC)13981354
035 $a(OCoLC)ocm13981354
035 $a(CStRLIN)NYCG86-B105046
035 $9ABU8403CU
035 $a(NNC)409969
035 $a409969
040 $aCMfNASA$cCMfNASA
090 $aTK7874$b.E43
245 00 $aElectron-beam, x-ray, & ion-beam techniques for submicrometer lithographies V :$b11-12 March 1986, Santa Clara, California /$cPhillip D. Blais, chairman/editor.
260 $aBellingham, Wash., USA :$bSPIE--the International Society for Optical Engineering,$c[1986], ©1986.
300 $avi, 272 pages :$billustrations ;$c28 cm.
336 $atext$2rdacontent
337 $aunmediated$2rdamedia
338 $avolume$2rdacarrier
490 1 $aProceedings of SPIE--the International Society for Optical Engineering ;$vv. 632
504 $aIncludes bibliographies and index.
650 0 $aLithography, Electron beam$vCongresses.$0http://id.loc.gov/authorities/subjects/sh2009130002
650 0 $aX-ray lithography$vCongresses.$0http://id.loc.gov/authorities/subjects/sh2008114009
650 0 $aIon beam lithography$vCongresses.
650 0 $aMicrolithography$vCongresses.$0http://id.loc.gov/authorities/subjects/sh2008107753
700 1 $aBlais, Phillip D.$0http://id.loc.gov/authorities/names/n82122793
830 0 $aProceedings of SPIE--the International Society for Optical Engineering ;$vv. 632.$0http://id.loc.gov/authorities/names/n42030541
852 00 $boff,eng$hTK7874$i.E43