| Record ID | ia:isbn_0819408263_1671 |
| Source | Internet Archive |
| Download MARC XML | https://archive.org/download/isbn_0819408263_1671/isbn_0819408263_1671_marc.xml |
| Download MARC binary | https://www.archive.org/download/isbn_0819408263_1671/isbn_0819408263_1671_meta.mrc |
LEADER: 01289cam a2200289 a 4500
001 92060181
003 DLC
005 20041026110751.0
008 920317s1992 waua b 101 0 eng
010 $a 92060181
020 $a0819408263 (pbk.)
040 $aDLC$cDLC
050 00 $aTK7874$b.E4834 1992
082 00 $a621.3815/2$220
245 00 $aElectron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing II :$b8-9 March 1992, San Jose, California /$cMartin Peckerar, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
260 $aBellingham, Wash. :$bSPIE,$cc1992.
300 $ax, 488 p. :$bill. ;$c28 cm.
490 1 $aProceedings / SPIE--the International Society for Optical Engineering ;$vv. 1671
504 $aIncludes bibliographical references and index.
650 0 $aLithography, Electron beam$xCongresses.
650 0 $aX-ray lithography$xCongresses.
650 0 $aIon beam lithography$xCongresses.
650 0 $aSemiconductors$xEtching$xCongresses.
650 0 $aMasks (Electronics)$xCongresses.
700 1 $aPeckerar, Martin Charles,$d1946-
710 2 $aSociety of Photo-optical Instrumentation Engineers.
830 0 $aProceedings of SPIE--the International Society for Optical Engineering ;$vv. 1671.