| Record ID | ia:isbn_0819444359_4689 |
| Source | Internet Archive |
| Download MARC XML | https://archive.org/download/isbn_0819444359_4689/isbn_0819444359_4689_marc.xml |
| Download MARC binary | https://www.archive.org/download/isbn_0819444359_4689/isbn_0819444359_4689_meta.mrc |
LEADER: 01471cam a22003137a 4500
001 2003268492
003 DLC
005 20040818155749.0
008 030225s2002 waua b 101 0 eng d
010 $a 2003268492
035 $a(OCoLC)ocm50505072
040 $aLHL$cLHL$dIXA$dDLC
042 $alccopycat
020 $a0819444359
050 00 $aTK7874$b.M43763 2002
245 00 $aMetrology, inspection, and process control for microlithography XVI :$b4-7 March, 2002, Santa Clara, [California] USA /$cDaniel J.C. Herr, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH.
260 $aBellingham, Washington :$bSPIE,$cc2002.
300 $a2 v. (xl, 1204 p.) :$bill. (some col.) ;$c28 cm.
490 1 $aSPIE proceedings series ;$vv. 4689
504 $aIncludes bibliographical references and author index.
650 0 $aIntegrated circuits$xInspection$vCongresses.
650 0 $aIntegrated circuits$xMeasurement$vCongresses.
650 0 $aMicrolithography$vCongresses.
650 0 $aProcess control$vCongresses.
700 1 $aHerr, Daniel J. C.
710 2 $aSociety of Photo-optical Instrumentation Engineers.
710 2 $aSemiconductor Equipment and Materials International.
710 2 $aInternational SEMATECH.
830 0 $aProceedings of SPIE--the International Society for Optical Engineering ;$vv. 4689.