| Record ID | ia:isbn_0819448435_5038 |
| Source | Internet Archive |
| Download MARC XML | https://archive.org/download/isbn_0819448435_5038/isbn_0819448435_5038_marc.xml |
| Download MARC binary | https://www.archive.org/download/isbn_0819448435_5038/isbn_0819448435_5038_meta.mrc |
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035 $a4184365
040 $aLHL$cLHL$dIXA
090 $aTK7874$b.I5554 2003
245 00 $aMetrology, inspection, and process control for microlithography XVII :$b24-27 February, 2003, Santa Clara, California, USA /$cDaniel J. Herr, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH.
260 $aBellingham, Wash. :$bSPIE,$c[2003], ©2003.
300 $a2 volumes (xxvii, 1248 pages) :$billustrations (some color) ;$c28 cm.
336 $atext$btxt$2rdacontent
337 $aunmediated$bn$2rdamedia
490 1 $aSPIE proceedings series ;$vv. 5038
504 $aIncludes bibliographical references and author index.
650 0 $aIntegrated circuits$xInspection$vCongresses.
650 0 $aIntegrated circuits$xMeasurement$vCongresses.
650 0 $aMicrolithography$vCongresses.$0http://id.loc.gov/authorities/subjects/sh2008107753
650 0 $aProcess control$vCongresses.$0http://id.loc.gov/authorities/subjects/sh2008110073
700 1 $aHerr, Daniel J. C.$0http://id.loc.gov/authorities/names/no2009187161
710 2 $aSociety of Photo-optical Instrumentation Engineers.$0http://id.loc.gov/authorities/names/n78088934
710 2 $aSemiconductor Equipment and Materials International.$0http://id.loc.gov/authorities/names/n90682619
710 2 $aInternational SEMATECH.$0http://id.loc.gov/authorities/names/no2001094348
830 0 $aProceedings of SPIE--the International Society for Optical Engineering ;$vv. 5038.$0http://id.loc.gov/authorities/names/n42030541
852 01 $boff,eng$hTK7874$i.I5554 2003g
866 41 $80$apt.1-2