| Record ID | ia:isbn_0819452920_5379 |
| Source | Internet Archive |
| Download MARC XML | https://archive.org/download/isbn_0819452920_5379/isbn_0819452920_5379_marc.xml |
| Download MARC binary | https://www.archive.org/download/isbn_0819452920_5379/isbn_0819452920_5379_meta.mrc |
LEADER: 01843cam a22003737a 4500
001 2004303081
003 DLC
005 20050308093220.0
008 041001s2004 wauac b 101 0 eng d
010 $a 2004303081
020 $a0819452920
035 $a(OCoLC)ocm55483541
040 $aLHL$cLHL$dCUS$dOCLCQ$dDLC
042 $alccopycat
050 00 $aTK7874$b.D4746 2004
082 00 $a621.381$222
245 00 $aDesign and process integration for microelectronic manufacturing II [sic] :$b26-27 February 2004, Santa Clara, California, USA /$cLars W. Liebmann, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH.
246 3 $aDesign and process integration for microelectronic manufacturing III
260 $aBellingham, Wash., USA :$bSPIE,$cc2004.
300 $axxviii, 302 p. :$bill., ports. ;$c28 cm.
490 1 $aSPIE proceedings series,$x0277-786X ;$vv. 5379
500 $a2004 conference is the third conference in the series.
504 $aIncludes bibliographical references and index.
650 0 $aIntegrated circuits$xDesign and construction$vCongresses.
650 0 $aIntegrated circuits$xDefects$xAnalysis$vCongresses.
650 0 $aSemiconductors$xDesign and construction$vCongresses.
650 0 $aSemiconductor wafers$xDefects$xAnalysis$vCongresses.
650 0 $aMicroelectronics industry$xQuality control$vCongresses.
650 0 $aQuality control$vCongresses.
700 1 $aLiebmann, Lars W.
710 2 $aSociety of Photo-optical Instrumentation Engineers.
710 2 $aSemiconductor Equipment and Materials International.
710 2 $aInternational SEMATECH.
830 0 $aProceedings of SPIE--the International Society for Optical Engineering ;$vv. 5379.