| Record ID | ia:lowtemperaturepl0005ouel |
| Source | Internet Archive |
| Download MARC XML | https://archive.org/download/lowtemperaturepl0005ouel/lowtemperaturepl0005ouel_marc.xml |
| Download MARC binary | https://www.archive.org/download/lowtemperaturepl0005ouel/lowtemperaturepl0005ouel_meta.mrc |
LEADER: 01778cam 2200457Ia 4500
001 ocm07357267
003 OCoLC
005 20210926205058.0
008 810422s1980 miuac b 001 0 eng d
040 $aNDD$beng$cNDD$dMUQ$dOCLCG$dOCLCQ$dOCLCO$dOCLCF$dOCLCQ$dNHM$dIL4J6$dOCLCO
020 $a0250403757
020 $a9780250403752
035 $a(OCoLC)7357267
050 4 $aTS183$b.E4 v.5
082 04 $a621.3$bE38, E38x, v.5
100 1 $aOuellette, Robert P.,$d1938-
245 10 $aLow-temperature plasma technology applications /$cRobert P. Ouellette, Marcel M. Barbier, Paul N. Cheremisinoff.
260 $aAnn Arbor, Mich. :$bAnn Arbor Science,$c©1980.
300 $axi, 147 pages :$billustrations, portraits ;$c24 cm.
336 $atext$btxt$2rdacontent
337 $aunmediated$bn$2rdamedia
338 $avolume$bnc$2rdacarrier
490 1 $aElectrotechnology ;$vv. 5
504 $aIncludes bibliographical references (pages 139-143) and index.
650 0 $aLow temperature plasmas.
650 6 $aPlasmas froids.
650 6 $aCouronne (Électricité)
650 6 $aPolymères.
650 6 $aPlasmochimie.
650 7 $aLow temperature plasmas.$2fast$0(OCoLC)fst01003159
650 7 $aPlasma engineering.$2nli
650 7 $aLow temperature plasmas.$2nli
700 1 $aBarbier, Marcel M.,$d1924-
700 1 $aCheremisinoff, Paul N.
776 08 $iOnline version:$aOuellette, Robert P., 1938-$tLow-temperature plasma technology applications.$dAnn Arbor, Mich. : Ann Arbor Science, ©1980$w(OCoLC)720720505
830 0 $aElectrotechnology (Ann Arbor Science Publishers, Inc.) ;$vv. 5.
029 1 $aAU@$b000002347100
029 1 $aGBVCP$b015014746
029 1 $aZWZ$b024082686
994 $aZ0$bP4A
948 $hNO HOLDINGS IN P4A - 57 OTHER HOLDINGS