MARC record from Internet Archive

LEADER: 03537cam 2200661 4500
001 ocm00572122
003 OCoLC
005 20200103090200.0
008 730129m19729999nyua b 000 0 eng
007 ta
010 $a 72083120
040 $aDLC$beng$cDLC$dOCLCQ$dBAKER$dLVB$dAU@$dZWZ$dOCLCQ$dCUD$dOCLCF$dBEDGE$dOCLCQ$dOCLCO$dOCLCQ$dCSJ$dOCLCQ$dCPO$dOCLCQ$dUWO$dAZU$dU3G$dOCLCQ$dS2H
019 $a606101007$a623024280$a976690334$a992166915$a1087448628
020 $a0824711432$q(v. 1)
020 $a9780824711436$q(v. 1)
020 $a0824763157
020 $a9780824763152
020 $a0824760662
020 $a9780824760663
035 $a(OCoLC)572122$z(OCoLC)606101007$z(OCoLC)623024280$z(OCoLC)976690334$z(OCoLC)992166915$z(OCoLC)1087448628
050 00 $aQD561$b.D54
082 04 $a546/.721/2
100 1 $aDiggle, John W.
245 10 $aOxides and oxide films.$cEdited by John W. Diggle.
260 $aNew York,$bM. Dekker,$c1972-<c1981>
300 $avolumes <1-6>$billustrations$c24 cm.
336 $atext$btxt$2rdacontent
337 $aunmediated$bn$2rdamedia
338 $avolume$bnc$2rdacarrier
490 1 $aThe Anodic behavior of metals and semiconductors series
500 $aVols. 3-4 edited by J.W. Diggle and A.K. Vijh; vols. 5-<6> edited by A.K. Vijh.
504 $aIncludes bibliographical references.
505 2 $aVol. 1:- Passivation and passivity -- Mecahanisms of ionic transport through oxide films -- Electronic current flow through ideal dielectric films -- Electrical double layer at metal oxide-solution interfaces. Vol. 2:- Anodic oxide films : influence of solid-state properties on electrochemical behavior -- Dielectric-loss mechanisms in amorphous oxide films -- Porous anodic films on aluminum -- Dissolution of oxide phases. Vol. 3:- Space-charge effects on anodic film formation -- Chemisorbtion phenomena on oxides : the dependence of chemisorbtion on the microscopic properties of zinc oxide. Vol. 4:- Diffusion and defects in oxides -- Radiation effects in the insulator region of MOS devices -- The aluminum-water system. Vol. 5:- Anodic oxides on noble metals -- Gas discharge anodization. Vol. 6:- Refractory oxides : high-temperature solid-gas and solid-liquid behavior -- Oxidation of compound semiconductor surfaces -- Oxide films on anodes during electrodeposition -- Memory effects in oxide films.
650 0 $aMetallic oxides.
650 0 $aMetallic films.
650 0 $aMetals$xAnodic oxidation.
650 1 $aMetallic films.
650 2 $aMetals$xAnodic oxidation.
650 6 $aOxydes me talliques.
650 6 $aCouches minces me talliques.
650 6 $aMe taux$xOxydation anodique.
650 7 $aMe taux.$2eclas
650 7 $aCorrosion.$2eclas
650 7 $aMetallic films.$2fast$0(OCoLC)fst01017885
650 7 $aMetallic oxides.$2fast$0(OCoLC)fst01017898
650 7 $aMetals$xAnodic oxidation.$2fast$0(OCoLC)fst01018053
650 7 $aOxydes me talliques.$2ram
650 7 $aCouches minces me talliques.$2ram
650 7 $aOxydation anodique.$2ram
700 1 $aVijh, Ashok K.
776 08 $iOnline version:$aDiggle, John W.$tOxides and oxide films.$dNew York, M. Dekker, 1972-<c1981>$w(OCoLC)624768764
830 0 $aAnodic behavior of metals and semiconductors series.
938 $aBaker & Taylor$bBKTY$c75.00$d75.00$i0824713613$n0000592216$sactive
029 1 $aAU@$b000000587824
029 1 $aNZ1$b2957272
029 1 $aZWZ$b051498685
994 $aZ0$bP4A
948 $hNO HOLDINGS IN P4A - 249 OTHER HOLDINGS