| Record ID | ia:photosensitiveme0000unse_i4a3 |
| Source | Internet Archive |
| Download MARC XML | https://archive.org/download/photosensitiveme0000unse_i4a3/photosensitiveme0000unse_i4a3_marc.xml |
| Download MARC binary | https://www.archive.org/download/photosensitiveme0000unse_i4a3/photosensitiveme0000unse_i4a3_meta.mrc |
LEADER: 01336pam a2200301 a 4500
001 93022823
003 DLC
005 20060718212656.0
008 930514s1993 dcua b 101 0 eng
010 $a 93022823
020 $a0841225273 (alk. paper)
040 $aDLC$cDLC$dDLC
050 00 $aQD1$b.A355 no. 238$aQD716.P45
082 00 $a540 s$a547.1/35$220
245 00 $aPhotosensitive metal-organic systems :$bmechanistic principles and applications /$c[editors], Charles Kutal, Nick Serpone.
260 $aWashington, DC :$bAmerican Chemical Society,$c1993.
300 $axiii, 449 p. :$bill. ;$c24 cm.
440 0 $aAdvances in chemistry series,$x0065-2393 ;$v238
500 $a"Developed from a symposium sponsored by the Division of Inorganic Chemistry of the American Chemical Society."
504 $aIncludes bibliographical references and indexes.
650 0 $aPhotocatalysis$xCongresses.
650 0 $aOrganic compounds$xCongresses.
650 0 $aOrganometallic compounds$xCongresses.
700 1 $aKutal, Charles.
700 1 $aSerpone, Nick,$d1939-
710 2 $aAmerican Chemical Society.$bDivision of Inorganic Chemistry.
856 42 $3Publisher description$uhttp://www.loc.gov/catdir/enhancements/fy0603/93022823-d.html
856 41 $3Table of contents only$uhttp://www.loc.gov/catdir/enhancements/fy0603/93022823-t.html