| Record ID | ia:thinfilmdepositi0000smit |
| Source | Internet Archive |
| Download MARC XML | https://archive.org/download/thinfilmdepositi0000smit/thinfilmdepositi0000smit_marc.xml |
| Download MARC binary | https://www.archive.org/download/thinfilmdepositi0000smit/thinfilmdepositi0000smit_meta.mrc |
LEADER: 03896cam 2201021 a 4500
001 ocm31782845
003 OCoLC
005 20200923203653.0
008 941220s1995 nyua b 001 0 eng
010 $a 94047002
040 $aDLC$beng$cDLC$dCUY$dUKM$dGZM$dUBA$dBAKER$dNLGGC$dBTCTA$dCUT$dYDXCP$dZWZ$dBDX$dYAM$dOCLCF$dBEDGE$dOCLCQ$dMTH$dOCLCQ$dBUF$dOCLCQ$dCPO$dOCLCQ$dTJC$dOCLCQ$dWURST$dS2H$dLIP
015 $aGB9545794$2bnb
019 $a123063698$a1191409569
020 $a0070585024
020 $a9780070585027
020 $a0071139133$q(International ed.)
020 $a9780071139137$q(International ed.)
035 $a(OCoLC)31782845$z(OCoLC)123063698$z(OCoLC)1191409569
050 00 $aTA418.9.T45$bS65 1995
082 00 $a621.3815/2$220
084 $a33.68$2bcl
084 $a33.68.$2bcl
100 1 $aSmith, Donald L.$q(Donald Leonard),$d1944-
245 10 $aThin-film deposition :$bprinciples and practice /$cDonald L. Smith.
260 $aNew York :$bMcGraw-Hill,$c©1995.
300 $axxiii, 616 pages :$billustrations ;$c24 cm
336 $atext$btxt$2rdacontent
337 $aunmediated$bn$2rdamedia
338 $avolume$bnc$2rdacarrier
504 $aIncludes bibliographical references and index.
505 0 $ach. 1. Thin-film technology -- ch. 2. Gas kinetics -- ch. 3. Vacuum technology -- ch. 4. Evaporation -- ch. 5. Deposition -- ch. 6. Epitaxy -- ch. 7. Chemical vapor deposition -- ch. 8. Energy beams -- ch. 9. Glow-discharge plasmas -- ch. 10. Film analysis -- Appendix A. Units -- Appendix B. Vapor pressures of the elements -- Appendix C. Sputtering yields of the elements -- Appendix D. Characteristics of tungsten filaments -- Appendix E. Sonic orifice flow.
650 0 $aThin films.
650 0 $aVapor-plating.
650 0 $aThin film devices.
650 1 $aVapor-plating.
650 2 $aThin film devices.
650 7 $aTechnologie industrielle.$2eclas
650 7 $aIngénierie.$2eclas
650 7 $aThin film devices.$2fast$0(OCoLC)fst01150011
650 7 $aThin films.$2fast$0(OCoLC)fst01150018
650 7 $aVapor-plating.$2fast$0(OCoLC)fst01164135
650 17 $aDepositie (scheikunde)$2gtt
650 17 $aDunne films.$2gtt
650 17 $aChemical vapour deposition.$2gtt
650 17 $aPlasma's.$2gtt
650 17 $aElektronenbundels.$2gtt
650 17 $aEpitaxie.$2gtt
650 7 $aMateriais e dispositivos semicondutores.$2larpcal
650 7 $aDeposicao de vapor (engenharia eletrica)$2larpcal
650 7 $aCouches minces.$2ram
653 0 $aThin films
653 00 $aafdeklagen
653 00 $acoatings
653 00 $asamenstelling
653 00 $acomposition
653 00 $agebreken
653 00 $adefects
653 00 $afilm
653 00 $agrensvlak
653 00 $ainterface
653 00 $amaterialen
653 00 $amaterials
653 00 $abescherming
653 00 $aprotection
653 00 $astructuur
653 00 $astructure
653 00 $aoppervlakbehandeling
653 00 $asurface treatment
653 00 $atesten
653 00 $atesting
653 10 $aEngineering (General)
653 10 $aTechniek (algemeen)
856 41 $3Table of contents$uhttp://catdir.loc.gov/catdir/toc/mh022/94047002.html
856 42 $3Contributor biographical information$uhttp://catdir.loc.gov/catdir/enhancements/fy1012/94047002-b.html
938 $aBaker & Taylor$bBKTY$c89.00$d89.00$i0070585024$n0002419811$sactive
938 $aBrodart$bBROD$n30722101$c$99.95
938 $aBaker and Taylor$bBTCP$n94047002$c$65.00
938 $aYBP Library Services$bYANK$n43015
029 1 $aAU@$b000010874622
029 1 $aAU@$b000057981169
029 1 $aDEBSZ$b045268630
029 1 $aNLGGC$b117726125
029 1 $aNZ1$b42608
029 1 $aUNITY$b065385829
029 1 $aYDXCP$b43015
029 1 $aZWZ$b031960243
994 $aZ0$bP4A
948 $hNO HOLDINGS IN P4A - 314 OTHER HOLDINGS