| Record ID | marc_columbia/Columbia-extract-20221130-002.mrc:119736589:1626 |
| Source | marc_columbia |
| Download Link | /show-records/marc_columbia/Columbia-extract-20221130-002.mrc:119736589:1626?format=raw |
LEADER: 01626cam a2200361 a 4500
001 597012
005 20220525204638.0
008 870922s1987 waua b 101 0 eng d
010 $a 87060741
020 $a0892528087
035 $a(OCoLC)506773759
035 $a(OCoLC)ocn506773759
035 $a(CStRLIN)NYCG87-B76794
035 $9ACQ1601CU
035 $a(NNC)597012
035 $a597012
040 $aCPaHP$cCPaHP$dNjP
090 $aTK7874$b.E4775 1987g
245 00 $aElectron-beam, X-ray, and ion-beam lithographies VI :$b5-6 March 1987, Santa Clara, California /$cPhillip D. Blais, chair/editor.
260 $aBellingham, Wash. :$bSPIE--the International Society for Optical Engineering,$c1987.
300 $avi, 265 pages :$billustrations ;$c28 cm.
336 $atext$2rdacontent
337 $aunmediated$2rdamedia
338 $avolume$2rdacarrier
490 1 $aProceedings of SPIE--the International Society for Optical Engineering ;$vv. 773
504 $aIncludes bibliographies and index.
650 0 $aLithography, Electron beam$vCongresses.$0http://id.loc.gov/authorities/subjects/sh2009130002
650 0 $aX-ray lithography$vCongresses.$0http://id.loc.gov/authorities/subjects/sh2008114009
650 0 $aIon beam lithography$vCongresses.
650 0 $aMicrolithography$vCongresses.$0http://id.loc.gov/authorities/subjects/sh2008107753
700 1 $aBlais, Phillip D.$0http://id.loc.gov/authorities/names/n82122793
830 0 $aProceedings of SPIE--the International Society for Optical Engineering ;$vv. 773.$0http://id.loc.gov/authorities/names/n42030541
852 00 $boff,eng$hTK7874$i.E4775 1987g