| Record ID | marc_columbia/Columbia-extract-20221130-002.mrc:358177967:1654 |
| Source | marc_columbia |
| Download Link | /show-records/marc_columbia/Columbia-extract-20221130-002.mrc:358177967:1654?format=raw |
LEADER: 01654cam a2200349 a 4500
001 782970
005 20220526010115.0
008 890925t19891989waua b 101 0 eng d
010 $a 88063652
020 $a0819400726 (pbk.)
035 $a(OCoLC)507855588
035 $a(OCoLC)ocn507855588
035 $a(CStRLIN)NYCG89-B68944
035 $9ADZ8892CU
035 $a(NNC)782970
035 $a782970
040 $aDNASA-G$cMiU$dMiU$dNNC
090 $aTK7871.85$b.M7411 1989g
245 00 $aMonitoring and control of plasma-enhanced processing of semiconductors :$b1-2 Novermber 1988, Santa Clara, California /$cJames E. Griffiths, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering.
260 $aBellingham, Wash., USA :$bSPIE,$c[1989], ©1989.
300 $aviii, 147 pages :$billustrations ;$c28 cm.
336 $atext$2rdacontent
337 $aunmediated$2rdamedia
338 $avolume$2rdacarrier
490 1 $aProceedings / SPIE--the International Society for Optical Engineering ;$vv. 1037
504 $aIncludes bibliographical references and index.
650 0 $aSemiconductors$xQuality control$vCongresses.
650 0 $aQuality control$xOptical methods$vCongresses.$0http://id.loc.gov/authorities/subjects/sh2008122815
700 1 $aGriffiths, James E.$0http://id.loc.gov/authorities/names/n88036769
710 2 $aSociety of Photo-optical Instrumentation Engineers.$0http://id.loc.gov/authorities/names/n78088934
830 0 $aProceedings of SPIE--the International Society for Optical Engineering ;$vv. 1037.$0http://id.loc.gov/authorities/names/n42030541
852 00 $boff,eng$hTK7871.85$i.M7411 1989g