| Record ID | marc_columbia/Columbia-extract-20221130-003.mrc:275287423:1755 |
| Source | marc_columbia |
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LEADER: 01755cam a2200397 a 4500
001 1246321
005 20220602001849.0
008 930512t19931993nyua b 101 0 eng
010 $a 93014058
020 $a0306444194
035 $a(OCoLC)502601858
035 $a(OCoLC)ocn502601858
035 $9AGX5918CU
035 $a(NNC)1246321
035 $a1246321
040 $aDLC$cDLC$dNNC
050 00 $aQC585.75.S55$bP48 1993
082 00 $a546/.6832$220
245 04 $aThe physics and chemistry of SiO₋b2₋s and the Si-SiO₋b2₋s interface 2 /$cedited by C. Robert Helms and Bruce E. Deal.
260 $aNew York ;$aLondon :$bPlenum Press,$c[1993], ©1993.
263 $a9308
300 $axvi, 502 pages :$billustrations ;$c26 cm
336 $atext$2rdacontent
337 $aunmediated$2rdamedia
338 $avolume$2rdacarrier
500 $aProceedings of the Second Symposium on the Physics and Chemistry of the SiO₋b2₋s and Si-SiO₋b2₋s Interface, held May 18-21, 1992, in St. Louis, Missouri.
504 $aIncludes bibliographical references and indexes.
650 0 $aSilica$xSurfaces$vCongresses.
650 0 $aDielectrics$xSurfaces$vCongresses.
650 0 $aSilicon dioxide films$vCongresses.
650 0 $aSurface chemistry$vCongresses.$0http://id.loc.gov/authorities/subjects/sh2008112385
650 0 $aSurfaces (Technology)$vCongresses.$0http://id.loc.gov/authorities/subjects/sh2008112386
700 1 $aHelms, C. Robert.$0http://id.loc.gov/authorities/names/n88013984
700 1 $aDeal, Bruce E.$0http://id.loc.gov/authorities/names/n88013985
711 2 $aSymposium on the Physics and Chemistry of SiO₂ and the Si-SiO₂ Interface$n(2nd :$d1992 :$cSaint Louis, Mo.)
852 00 $boff,che$hQC585.75.S55$iP48 1993