| Record ID | marc_columbia/Columbia-extract-20221130-005.mrc:515197757:1327 |
| Source | marc_columbia |
| Download Link | /show-records/marc_columbia/Columbia-extract-20221130-005.mrc:515197757:1327?format=raw |
LEADER: 01327mam a2200349 a 4500
001 2402655
005 20220616040605.0
008 990621t19991999gw a b 001 0 eng
010 $a 99233639
015 $aGB99-Z3958
020 $a3527295615
035 $a(OCoLC)ocm40684553
035 $9APU3742CU
035 $a2402655
040 $aDLC$cDLC$dUKM$dOHX
041 1 $aeng$hger
050 00 $aTK7872.M3$bK64 1999
072 7 $aTP$2lcco
082 00 $a621.3815/31$221
100 1 $aKöhler, J. M.$q(J. Michael),$d1956-$0http://id.loc.gov/authorities/names/n98091673
240 10 $aÄtzverfahren für die Mikrotechnik.$lEnglish
245 10 $aEtching in microsystem technology /$cMichael Köhler ; translated by Antje Wiegand.
260 $aWeinheim ;$aNew York :$bWiley-VCH,$c[1999], ©1999.
300 $axvi, 368 pages :$billustrations ;$c25 cm
336 $atext$btxt$2rdacontent
337 $aunmediated$bn$2rdamedia
504 $aIncludes bibliographical references ([345]-360) and index.
650 0 $aMasks (Electronics)$0http://id.loc.gov/authorities/subjects/sh85081822
650 0 $aMicrolithography.$0http://id.loc.gov/authorities/subjects/sh85084858
650 0 $aPlasma etching.$0http://id.loc.gov/authorities/subjects/sh85103070
650 4 $aMicrolithography.
852 00 $boff,eng$hTK7872.M3$iK64 1999