| Record ID | marc_columbia/Columbia-extract-20221130-007.mrc:477827703:1713 |
| Source | marc_columbia |
| Download Link | /show-records/marc_columbia/Columbia-extract-20221130-007.mrc:477827703:1713?format=raw |
LEADER: 01713cam a2200397 i 4500
001 3474213
005 20221020075902.0
008 781220s1978 dcua b f000 0 eng d
020 $c$2.50 (pbk. :)
035 $a(OCoLC)ocm04482406
035 $9AJG0344DC
035 $a(NNC)3474213
035 $a3474213
037 $b20402
040 $cGPO$dMvI-ocm$dMvI
074 $a247
086 0 $aC 13.10:400-49
099 $aC 13.10:400-49
245 00 $aAngular sensitivity of controlled implanted doping profiles /$cRobert G. Wilson [and others].
260 $aWashington :$bDepartment of Commerce, National Bureau of Standards : for sale by the Supt. of Docs., U.S. Govt. Print. Off.,$c1978.
336 $atext$btxt$2rdacontent
337 $aunmediated$bn$2rdamedia
490 1 $aNBS special publication ;$v400-49
490 1 $aSemiconductor measurement technology
500 $aIssued Nov. 1978.
500 $aCODEN: XNBSAV.
500 $aSponsored by the Defense Advanced Research Projects Agency and the National Bureau of Standards.
504 $aIncludes bibliographical references.
650 0 $aSemiconductor doping.$0http://id.loc.gov/authorities/subjects/sh85119890
650 0 $aIon implantation.$0http://id.loc.gov/authorities/subjects/sh85067801
700 1 $aWilson, Robert G.$0http://id.loc.gov/authorities/names/n82163167
710 1 $aUnited States.$bNational Bureau of Standards.$0http://id.loc.gov/authorities/names/n79021148
710 1 $aUnited States.$bDefense Advanced Research Projects Agency.$0http://id.loc.gov/authorities/names/n79004228
830 0 $aNBS special publication ;$v400-49.
830 0 $aSemiconductor measurement technology.
852 30 $boff,docs$hC 13.10:400-49