| Record ID | marc_columbia/Columbia-extract-20221130-009.mrc:184020273:3482 |
| Source | marc_columbia |
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LEADER: 03482cam a2200349Ia 4500
001 4175059
005 20221027045900.0
008 030728t20032003waua b 101 0 eng d
020 $a0819448486
035 $a(OCoLC)ocm52734848
035 $a(NNC)4175059
035 $a4175059
040 $aTEF$cTEF$dOrLoB-B
050 4 $aTK7874$b.C67 2003
245 00 $aCost and performance in integrated circuit creation :$b27-28 February 2003, Santa Clara, California, USA /$cAlfred K.K. Wong, Kevin M. Monahan, chairs/editors ; sponsored ... by SPIE--the International Society for Optical Engineering.
260 $aBellingham, Wash. :$bSPIE,$c[2003], ©2003.
300 $avii, 186 pages :$billustrations ;$c28 cm.
336 $atext$btxt$2rdacontent
337 $aunmediated$bn$2rdamedia
490 1 $aSPIE proceedings series,$x0277-786X ;$vv. 5043
504 $aIncludes bibliographical references and index.
505 00 $tSilicon economics /$rJ. Hogan, A. R. Chatila, B. Bruggeman and V. V. Boksha -- $tTechnology acceleration: he change in industry requirements /$rW. J. Trybula -- $tTechnology acceleration: the suppliers' challenge /$rW. J. Trybula -- $tMicroeconomics of yield learning in semiconductor manufacturing /$rK. M. Monahan -- $tMicroeconomics of process control in semiconductor manufacturing /$rK. M. Monahan -- $tValue-based management of design reuse /$rJ. A. Carballo, D. L. Cohn, W. Belluomini and R. K. Montoye -- $tMask cost for sub-100-nm technologies: stopping a runaway? /$rA. P. Balasinski -- $tDoes technology acceleration equate to mask cost acceleration? /$rW. J. Trybula and B. J. Grenon -- $tMultiproject wafers: not just for million-dollar mask sets /$rR. D. Morse -- $tDIVAS: an integrated networked system for mask defect dispositioning and defect management /$rS. Munir, D. Bald, V. Tolani and F. Ghadiali -- $tToward performance-driven reduction of the cost of RET-based lithography control /$rP. Gupta, A. B. Kahng, D. Sylvester and J. Yang -- $tEffects of grid-placed contacts on circuit performance /$rJ. Wang and A. K. K. Wong -- $tCost-effective strategies for ASIC masks /$rD. Pramanik, H. H. Kamberian, C. J. Progler, M. Sanie and D. Pinto -- $tElectrical validation of resolution enhancement techniques /$rK. N. Taravade, N. P. Callan, E. H. Croffie and A. Ahmad -- $tPractical quality metrics for resolution enhancement software /$rR. E. Boone, K. Lucas, R. Wynd, M. Boatright, M. A. Thompson and A. J. Reich -- $tImproving IC process efficiency with critical materials management /$rK. L. Hanson and R. E. Andrews -- $tUnderstanding the operating expense relationships of layouts on excimer photo tools /$rD. B. Ames.
650 0 $aIntegrated circuits$xDesign and construction$xCosts$vCongresses.
650 0 $aIntegrated circuits$xDefects$xAnalysis$vCongresses.
650 0 $aSemiconductors$xDesign and construction$xCosts$vCongresses.
650 0 $aSemiconductor wafers$xDefects$xAnalysis$vCongresses.
650 0 $aMicroelectronics industry$xQuality control$vCongresses.
700 1 $aWong, Alfred Kwok-Kit.$0http://id.loc.gov/authorities/names/n2001000478
700 1 $aMonahan, Kevin M.$0http://id.loc.gov/authorities/names/n84016476
710 2 $aSociety of Photo-optical Instrumentation Engineers.$0http://id.loc.gov/authorities/names/n78088934
830 0 $aProceedings of SPIE--the International Society for Optical Engineering ;$vv. 5043.$0http://id.loc.gov/authorities/names/n42030541
852 00 $boff,eng$hTK7874$i.C67 2003g