MARC Record from marc_columbia

LEADER: 04017cam a2200349 a 4500
001 6973748
005 20221130195827.0
008 080509t20092009njua b 001 0 eng
010 $a 2008021425
019 $a230180326
020 $a9780470099575 (cloth)
020 $a0470099577 (cloth)
024 $a40016162075
035 $a(OCoLC)ocn228427382
035 $a(NNC)6973748
035 $a6973748
040 $aDLC$cDLC$dBTCTA$dBAKER$dC#P$dBWX$dCDX$dOrLoB-B
050 00 $aTA418.9.N35$bU53 2009
082 00 $a620/.5$222
100 1 $aRogers, John A.$0http://id.loc.gov/authorities/names/n82208192
245 10 $aUnconventional nanopatterning techniques and applications /$cJohn A. Rogers, Hong H. Lee.
260 $aHoboken, N.J. :$bWiley,$c[2009], ©2009.
300 $axv, 598 pages :$billustrations ;$c25 cm
336 $atext$btxt$2rdacontent
337 $aunmediated$bn$2rdamedia
504 $aIncludes bibliographical references and index.
505 00 $gI.$tNanopatterning Techniques -- $g1.$tIntroduction -- $g2.$tMaterials -- $g3.$tPatterning Based on Natural Force -- $g4.$tPatterning Based on Work of Adhesion -- $g5.$tPatterning Based on Light: Optical Soft Lithography -- $g6.$tPatterning Based on External Force: Nanoimprint Lithography /$rL. Jay Guo -- $g7.$tPatterning Based on Edge Effects: Edge Lithography /$rMatthias Geissler, Joseph M. McLellan, Eric P. Lee and Younan Xia -- $g8.$tPatterning with Electrolyte: Solid-State Superionic Stamping /$rKeng H. Hsu, Peter L. Schultz, Nicholas X. Fang and Placid M. Ferreira -- $g9.$tPatterning with Gels: Lattice-Gas Models /$rPaul J. Wesson and Bartosz A. Grzybowski -- $g10.$tPatterning with Block Copolymers /$rJia-Yu Wang, Wei Chen and Thomas P. Russell -- $g11.$tPerspective on Applications -- $gII.$tApplications -- $g12.$tSoft Lithography for Microfluidic Microelectromechanical Systems (MEMS) and Optical Devices /$rSvetlana M. Mitrovski, Shraddha Avasthy, Evan M. Erickson, Matthew E. Stewart, John A. Rogers and Ralph G. Nuzzo -- $g13.$tUnconventional Patterning Methods for BioNEMS /$rPilnam Kim, Yanan Du, Ali Khademhosseini, Robert Langer and Kahp Y. Suh -- $g14.$tMicro Total Analysis System /$rYuki Tanaka and Takehiko Kitamori -- $g15.$tCombinations of Top-Down and Bottom-Up Nanofabrication Techniques and Their Application to Create Functional Devices /$rPascale Maury, David N. Reinhoudt and Jurriaan Huskens -- $g16.$tOrganic Electronic Devices -- $g17.$tInorganic Electronic Devices -- $g18.$tMechanics of Stretchable Silicon Films on Elastomeric Substrates /$rHanqing Jiang, Jizhou Song, Yonggang Huang and John A. Rogers -- $g19.$tMultiscale Fabrication of Plasmonic Structures /$rJoel Henzie, Min H. Lee and Teri W. Odom -- $g20.$tA Rigiflex Mold and Its Applications /$rSe-Jin Choi, Tae-Wan Kim and Seung-Jun Baek -- $g21.$tNanoimprint Technology for Future Liquid Crystal Display /$rJong M. Kim, Hwan Y. Choi, Moon-G. Lee, Seungho Nam, Jin H. Kim, Seongmo Whang, Soo M. Lee, Byoung H. Cheong, Hyuk Kim, Ji M. Lee and In T. Han.
520 1 $a"This book helps readers learn the skills needed to fully leverage the most promising unconventional nanofabrication techniques. It focuses on soft lithographic and related imprint lithographic methods, but also features self-assembly approaches that have excellent potential. All the techniques covered have the scalability, throughput, and low cost operation needed for use in practical applications." "Unconventional Nanopatterning Techniques and Applications offers practitioners, developers, and students the ability to not only implement the latest techniques, but also expand the capabilities and reach of these techniques with their own ideas and novel applications."--BOOK JACKET.
650 0 $aNanoparticles.$0http://id.loc.gov/authorities/subjects/sh85089689
650 0 $aNanostructured materials.$0http://id.loc.gov/authorities/subjects/sh93000864
700 1 $aLee, Hong H.$0http://id.loc.gov/authorities/names/n82234012
852 00 $boff,eng$hTA418.9.N35$iU53 2009