| Record ID | marc_columbia/Columbia-extract-20221130-015.mrc:66916707:1639 |
| Source | marc_columbia |
| Download Link | /show-records/marc_columbia/Columbia-extract-20221130-015.mrc:66916707:1639?format=raw |
LEADER: 01639cam a22003614a 4500
001 7189602
005 20221130213641.0
008 090126t20092009nyua b 001 0 eng
010 $a 2009002187
020 $a9780071549189 (alk. paper)
020 $a0071549188 (alk. paper)
029 1 $aCDX$b8537562
029 1 $aBWX$bR8783197
035 $a(OCoLC)ocn244060505
035 $a(OCoLC)244060505
035 $a(NNC)7189602
035 $a7189602
040 $aDLC$cDLC$dBTCTA$dBAKER$dYDXCP$dC#P$dCDX$dBWX$dOrLoB-B
050 00 $aTK7872.M3$bE987 2009
082 00 $a621.3815/31$222
245 00 $aExtreme ultraviolet lithography /$c[edited by] Banqiu Wu, Ajay Kumar.
260 $aNew York :$bMcGraw-Hill,$c[2009], ©2009.
300 $axiv, 465 pages :$billustrations ;$c24 cm
336 $atext$btxt$2rdacontent
337 $aunmediated$bn$2rdamedia
504 $aIncludes bibliographical references and index.
505 00 $g1.$tIntroduction -- $g2.$tExposure system -- $g3.$tEUV sources -- $g4.$tEUV optics -- $g5.$tMultilayer interference coatings for EUVL -- $g6.$tEUV metrology -- $g7.$tEUV photoresist -- $g8.$tEUVL masks.
650 0 $aExtreme ultraviolet lithography.$0http://id.loc.gov/authorities/subjects/sh2009000606
650 0 $aIntegrated circuits$xMasks.$0http://id.loc.gov/authorities/subjects/sh85067122
650 0 $aIntegrated circuits$xDesign and construction.$0http://id.loc.gov/authorities/subjects/sh85067118
700 1 $aWu, Banqiu.$0http://id.loc.gov/authorities/names/n2005028134
700 1 $aKumar, Ajay,$d1962-$0http://id.loc.gov/authorities/names/n2009004974
852 00 $boff,eng$hTK7872.M3$iE987 2009