MARC Record from marc_columbia

LEADER: 07457cam a2200805Mi 4500
001 15124442
005 20220817092039.0
006 m o d
007 cr cn|||||||||
008 170718s2017 si a ob 001 0 eng d
035 $a(OCoLC)ocn994496892
035 $a(NNC)15124442
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019 $a993596594$a993772097$a1000430225$a1006792316$a1015203817$a1029498750$a1031054126$a1044512931$a1056571975$a1202482346$a1303442544
020 $a9781315196626$q(electronic bk.)
020 $a131519662X$q(electronic bk.)
020 $a9781351767613$q(electronic bk.)
020 $a1351767615$q(electronic bk.)
020 $a9781523114351$q(electronic bk.)
020 $a1523114355$q(electronic bk.)
020 $z9781351767606
020 $z1351767607
020 $z9789814774093
020 $z981477409X
020 $z9781351767590
020 $z1351767593
024 7 $a10.1201/9781315196626$2doi
035 $a(OCoLC)994496892$z(OCoLC)993596594$z(OCoLC)993772097$z(OCoLC)1000430225$z(OCoLC)1006792316$z(OCoLC)1015203817$z(OCoLC)1029498750$z(OCoLC)1031054126$z(OCoLC)1044512931$z(OCoLC)1056571975$z(OCoLC)1202482346$z(OCoLC)1303442544
037 $a9781351767606$bIngram Content Group
050 4 $aTK7881.15$b.G35 2017
072 7 $aTEC$x009070$2bisacsh
082 14 $a621.317$bG171
049 $aZCUA
245 00 $aGallium nitride power devices /$cedited by Hongyu Yu, Tianli Duan.
264 1 $aSingapore :$bPan Stanford Publishing,$c2017.
300 $a1 online resource (x, 298 pages) :$billustrations
336 $atext$btxt$2rdacontent
337 $acomputer$bc$2rdamedia
338 $aonline resource$bcr$2rdacarrier
347 $adata file$2rda
504 $aIncludes bibliographical references and index.
520 $a"GaN is considered the most promising material candidate in next-generation power device applications, owing to its unique material properties, for example, bandgap, high breakdown field, and high electron mobility. Therefore, GaN power device technologies are listed as the top priority to be developed in many countries, including the United States, the European Union, Japan, and China. This book presents a comprehensive overview of GaN power device technologies, for example, material growth, property analysis, device structure design, fabrication process, reliability, failure analysis, and packaging. It provides useful information to both students and researchers in academic and related industries working on GaN power devices. GaN wafer growth technology is from Enkris Semiconductor, currently one of the leading players in commercial GaN wafers. Chapters 3 and 7, on the GaN transistor fabrication process and GaN vertical power devices, are edited by Dr. Zhihong Liu, who has been working on GaN devices for more than ten years. Chapters 2 and 5, on the characteristics of polarization effects and the original demonstration of AlGaN/GaN heterojunction field-effect transistors, are written by researchers from Southwest Jiaotong University. Chapters 6, 8, and 9, on surface passivation, reliability, and package technologies, are edited by a group of researchers from the Southern University of Science and Technology of China."--Provided by publisher.
505 0 $aCover Page; Halftitle Page; Title Page; Copyright Page; Contents; Preface; 1. The Growth Technology of High-Voltage GaN on Silicon; 1.1 Introduction; 1.2. The Nucleation Layer Growth; 1.3. Stress Engineering; 1.3.1 The LT-Al(Ga)N Interlayer; 1.3.2 The AlGaN Buffer Layer; 1.3.3 Al(Ga)N/GaN SLs; 1.4. Leakage Reduction and Breakdown Voltage Enhancement; 1.4.1 Compensational Doping; 1.4.2 Other Methods; 1.5. Conclusions; 2. The Characteristics of Polarization Effects in GaN Heterostructures; 2.1. Introduction; 2.2. The ab initio Theory in III-V Semiconductors; 2.2.1 Spontaneous Polarization.
505 8 $a2.2.2 Piezoelectric Polarization2.2.3 The Analytical Model of a 2DEG at the AlGaN/GaN Interface; 2.3. Polarization Effects Discussion; 3. GaN Transistor Fabrication Process; 3.1. Device Isolation; 3.1.1 Wet Etch; 3.1.2 Dry Etch; 3.1.3 Implantation Isolation; 3.2. Ohmic Contacts; 3.2.1 The Ti/Al/X/Au Metal Scheme; 3.2.2 CMOS-Compatible Ohmic Contacts; 3.3. Gate Fabrication; 3.3.1 Schottky Gate; 3.3.2 Metal-Insulator-Semiconductor Gate; 3.4. Surface Passivation; 3.5. Field Plates; 4. Conventional AlGaN/GaN Heterojunction Field-Effect Transistors; 4.1. Introduction.
505 8 $a4.2. Polarization and Generation of a 2DEG4.2.1 Polarization; 4.2.2 Generation of a 2DEG; 4.3. GaN HEMT Operation Principle; 4.4. Breakdown for an AlGaN/GaN HEMT; 4.4.1 Gate Electric Field Plate; 4.4.2 Source Electric Field Plate; 4.4.3 Air Bridge Field Plate; 5. Original Demonstration of Depletion-Mode and Enhancement-Mode AlGaN/GaN Heterojunction Field-Effect Transistors; 5.1. Introduction; 5.2. Development of E-Mode AlGaN/GaN HFETs; 5.2.1 E-Mode HFET with a P-Type Cap Layer; 5.2.2 E-Mode HFET with a Recessed-Barrier Layer; 5.2.3 E-Mode HFET with a Double-Barrier Layer.
505 8 $a5.2.4 Metal-Insulator-Semiconductor HFET5.2.5 N-Polar GaN-Based E-Mode HFETs; 5.2.6 E-Mode HEMTs by Fluoride-Based Plasma Treatment; 5.2.7 GaN-Based MOSFETs and AlGaN/GaN MOS-HFETs; 5.2.8 Other Types of E-Mode HFETs; 5.3. Charge Control Models; 5.3.1 CCM in a Heterojunction with a Single Barrier; 5.3.2 CCM in a Heterojunction with Double Barriers; 5.3.3 CCM in a Heterojunction with Multibarriers; 5.4. Reliability of the Threshold Voltage; 5.4.1 Traps Exist in III-N Barrier Layers; 5.4.2 Fixed Charges Exist at the Dielectric/III-N Heterointerface or in the Dielectric.
505 8 $a5.4.3 Dynamic Recovery of the Threshold Voltage Shift by Trapping Speed5.4.4 Lattice-Mismatch-Induced Reduction of Strain or Stress; 6. Surface Passivation and GaN MIS-HEMTs; 6.1. Introduction; 6.2. Surface Passivation; 6.3. Metal-Insulator-Semiconductor High-Electron-Mobility Transistors; 6.3.1 Characteristics of Various Gate Dielectrics; 6.3.2 Atomic Layer Deposition of Al2O3; 6.3.3 Characterization of the Interface Traps by Traditional C-V Measurement; 6.3.4 Other Approaches to Measure the the Interface Trap Density; 6.3.4.1 Hysteresis method; 6.3.4.2 Subthreshold swing method.
650 0 $aPower electronics.
650 0 $aGallium nitride$xElectric properties.
650 0 $aSemiconductors.
650 0 $aGallium nitride.
650 2 $aSemiconductors
650 6 $aNitrure de gallium.
650 6 $aÉlectronique de puissance.
650 6 $aSemi-conducteurs.
650 7 $asemiconductor.$2aat
650 7 $aTECHNOLOGY & ENGINEERING$xMechanical.$2bisacsh
650 7 $aGallium nitride.$2fast$0(OCoLC)fst00937295
650 7 $aGallium nitride$xElectric properties.$2fast$0(OCoLC)fst00937296
650 7 $aPower electronics.$2fast$0(OCoLC)fst01074238
650 7 $aSemiconductors.$2fast$0(OCoLC)fst01112198
655 0 $aElectronic books.
655 4 $aElectronic books.
700 1 $aYu, Hongyu,$d1976-$eeditor.
700 1 $aDuan, Tianli,$eeditor.
776 08 $iPrint version:$z9789814774093
856 40 $uhttp://www.columbia.edu/cgi-bin/cul/resolve?clio15124442$zTaylor & Francis eBooks
852 8 $blweb$hEBOOKS