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MARC Record from marc_columbia

Record ID marc_columbia/Columbia-extract-20221130-031.mrc:39317598:3262
Source marc_columbia
Download Link /show-records/marc_columbia/Columbia-extract-20221130-031.mrc:39317598:3262?format=raw

LEADER: 03262cam a2200565Ma 4500
001 15069748
005 20220402233551.0
006 m o d
007 cr cn|||||||||
008 020910s2003 nyua ob 001 0 eng d
035 $a(OCoLC)ocn133164619
035 $a(NNC)15069748
040 $aCOCUF$beng$epn$cCOCUF$dBAKER$dOCLCQ$dN$T$dYDXCP$dTEFOD$dUAB$dPUL$dIDEBK$dNRU$dE7B$dTULIB$dEBLCP$dOCLCQ$dOCLCF$dOCLCQ$dOCLCO$dCRCPR$dOCLCQ$dUIU$dMERUC$dBTCTA$dOCLCQ$dCOO$dPIFBY$dOCLCQ$dAU@$dVT2$dYDX$dLEAUB$dTYFRS$dOCLCQ$dUKAHL$dK6U$dOCLCO$dOCLCQ$dOCLCO
019 $a52479653$a54063073$a191924849$a437068729$a503050734$a647307848$a779917076$a991943995$a1077294000$a1084439595
020 $a9780824743451$q(electronic bk.)
020 $a0824743458$q(electronic bk.)
020 $a0203909097
020 $a9780203909096
020 $z9780824708511$q(alk. paper)
020 $z0824708512$q(alk. paper)
035 $a(OCoLC)133164619$z(OCoLC)52479653$z(OCoLC)54063073$z(OCoLC)191924849$z(OCoLC)437068729$z(OCoLC)503050734$z(OCoLC)647307848$z(OCoLC)779917076$z(OCoLC)991943995$z(OCoLC)1077294000$z(OCoLC)1084439595
037 $bOverDrive, Inc.$nhttp://www.overdrive.com
050 4 $aTK7871.15.F5$bH63 2003eb
072 7 $aTEC$x008100$2bisacsh
072 7 $aTEC$x008090$2bisacsh
082 04 $a621.3815/2$221
049 $aZCUA
100 1 $aHodes, Gary.
245 10 $aChemical solution deposition of semiconductor films /$cGary Hodes.
260 $aNew York :$bMarcel Dekker,$c©2003.
300 $a1 online resource (xii, 376 pages) :$billustrations
336 $atext$btxt$2rdacontent
337 $acomputer$bc$2rdamedia
338 $aonline resource$bcr$2rdacarrier
504 $aIncludes bibliographical references and index.
588 0 $aPrint version record.
520 $aThis reference examines the processes involved in the deposition of semiconductor films by chemical solution deposition and explains the effect of various process parameters on final film and film deposition outcomes through the use of detailed examples--discussing specific depositions of a wide range of semiconductors and properties of the resulting films.
505 0 $aPreface; Contents; Fundamentals; General Review; Mechanisms of Chemical Deposition; II-VI Semiconductors; PbS and PbSe; Other Sulphides and Selenides; Oxides and Other Semiconductors; Ternary Semiconductors; Photovoltaic and Photoelectrochemical Properties; Nanocrystallinity and Size Quantization in Chemical Deposited Semiconductor Films; Index.
650 0 $aSemiconductor films.
650 0 $aPlating baths.
650 6 $aCouches à semi-conducteurs.
650 6 $aBains d'électroplastie.
650 7 $aTECHNOLOGY & ENGINEERING$xElectronics$xSolid State.$2bisacsh
650 7 $aTECHNOLOGY & ENGINEERING$xElectronics$xSemiconductors.$2bisacsh
650 7 $aPlating baths.$2fast$0(OCoLC)fst01066829
650 7 $aSemiconductor films.$2fast$0(OCoLC)fst01112128
655 4 $aElectronic books.
776 08 $iPrint version:$aHodes, Gary.$tChemical solution deposition of semiconductor films.$dNew York : Marcel Dekker, ©2003$w(DLC) 2002034844
856 40 $uhttp://www.columbia.edu/cgi-bin/cul/resolve?clio15069748$zTaylor & Francis eBooks
852 8 $blweb$hEBOOKS