| Record ID | marc_loc_2016/BooksAll.2016.part01.utf8:212005746:1420 |
| Source | Library of Congress |
| Download Link | /show-records/marc_loc_2016/BooksAll.2016.part01.utf8:212005746:1420?format=raw |
LEADER: 01420cam a2200337 a 4500
001 00699160
003 DLC
005 20041103095405.0
008 000807s1999 waua b 101 0 eng d
010 $a 00699160
035 $a(OCoLC)ocm42467808
040 $aCUS$cCUS$dOCL$dDLC
042 $alccopycat
020 $a081943230X
050 00 $aTK7872.M3$bP4724 1999
082 00 $a621.3815/31$221
245 00 $aPhotomask and X-ray mask technology VI :$b13-14 April, 1999, Yokohama, Japan /$cHiraoki Morimoto, editor ; sponsored by Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations, Japan Society of Applied Physics ... [et al.].
260 $aBellingham, Wash., USA :$bSPIE,$cc1999.
300 $axiii, 628 p. :$bill. (some col.) ;$c28 cm.
490 1 $aSPIE proceedings series ;$vv. 3748
504 $aIncludes bibliographical references and index.
650 0 $aMasks (Electronics)$vCongresses.
650 0 $aIntegrated circuits$xMasks$vCongresses.
650 0 $aX-ray lithography$vCongresses.
650 0 $aMicrolithography$vCongresses.
650 0 $aOptoelectronic devices$xDesign and construction$vCongresses.
700 1 $aMorimoto, Hiraoki.
710 2 $aPhotomask Japan.
710 2 $aBACUS (Technical group)
710 2 $aŌyō Butsuri Gakkai.
830 0 $aProceedings of SPIE--the International Society for Optical Engineering ;$vv. 3748.