| Record ID | marc_loc_2016/BooksAll.2016.part15.utf8:116254500:870 |
| Source | Library of Congress |
| Download Link | /show-records/marc_loc_2016/BooksAll.2016.part15.utf8:116254500:870?format=raw |
LEADER: 00870pam a2200241 a 4500
001 84001145
003 DLC
005 19841130000000.0
008 840611s1984 ne a b 00110 eng
010 $a 84001145
020 $a0444869050
050 0 $aTK7871.85$b.D79 1984
082 0 $a621.381/73
245 00 $aDry etching for microelectronics /$cedited by Ronald A. Powell.
260 0 $aAmsterdam ;$aNew York :$bNorth-Holland Physics Pub. ;$aNew York, N.Y. :$bDistributors for the USA and Canada, Elsevier Science Pub. Co.,$c1984.
300 $axi, 299 p. :$bill. ;$c24 cm.
490 1 $aMaterials processing--theory and practices ;$vv. 4
504 $aBibliography: p. 223-294.
500 $aIncludes index.
650 0 $aSemiconductors$xEtching.
650 0 $aPlasma etching.
700 10 $aPowell, Ronald A.
830 0 $aMaterials processing, theory and practices ;$vv. 4.