| Record ID | marc_loc_2016/BooksAll.2016.part18.utf8:165679401:1290 |
| Source | Library of Congress |
| Download Link | /show-records/marc_loc_2016/BooksAll.2016.part18.utf8:165679401:1290?format=raw |
LEADER: 01290cam a2200289 a 4500
001 88021099
003 DLC
005 19910424104645.9
008 880610s1988 dcua b 10100 eng
010 $a 88021099 //r91
020 $a084121400X
040 $aDLC$cDLC$dDLC
050 00 $aQD1$b.A355 no. 218$aTK7871.15.P6
082 00 $a540 s$a621.381$219
245 00 $aElectronic and photonic applications of polymers /$cMurrae J. Bowden, editor, S. Richard Turner, editor.
260 0 $aWashington, DC :$bAmerican Chemical Society,$c1988.
300 $axiii, 372 p. :$bill. ;$c24 cm.
440 0 $aAdvances in chemistry series ;$v218
500 $a"Developed from a symposium sponsored by the Division of Polymeric Materials: Science and Engineering at the 192nd Meeting of the American Chemical Society, Anaheim, California, September 7-12, 1986."
504 $aIncludes bibliographical references and indexes.
650 0 $aPolymers.
650 0 $aPhotoresists$xCongresses.
650 0 $aMicrolithography$xMaterials$xCongresses.
700 10 $aBowden, M. J.,$d1943-
700 10 $aTurner, S. Richard,$d1942-
710 20 $aAmerican Chemical Society.$bDivision of Polymeric Materials: Science and Engineering.
710 20 $aAmerican Chemical Society.$bMeeting$n(192nd :$d1986 :$cAnaheim, Calif.)