Record ID | marc_loc_2016/BooksAll.2016.part18.utf8:178598114:969 |
Source | Library of Congress |
Download Link | /show-records/marc_loc_2016/BooksAll.2016.part18.utf8:178598114:969?format=raw |
LEADER: 00969pam a2200253 a 4500
001 88038244
003 DLC
005 20031230180155.0
008 881201s1989 njua b 001 0 eng
010 $a 88038244
020 $a081551199X :$c$72.00
040 $aDLC$cDLC$dDLC
050 00 $aQC702.7.I55$bH36 1989
082 00 $a621.381/7$219
245 00 $aHandbook of ion beam processing technology :$bprinciples, deposition, film modification, and synthesis /$cedited by Jerome J. Cuomo and Stephen M. Rossnagel, Harold R. Kaufman.
260 $aPark Ridge, N.J., U.S.A. :$bNoyes Publications,$cc1989.
300 $axviii, 438 p. :$bill. ;$c25 cm.
504 $aIncludes bibliographies and index.
650 0 $aIon implantation.
650 0 $aIon bombardment$xIndustrial applications.
700 1 $aCuomo, J. J.
700 1 $aRossnagel, Stephen M.
700 1 $aKaufman, Harold R.
856 42 $3Publisher description$uhttp://www.loc.gov/catdir/description/wap041/88038244.html