| Record ID | marc_loc_2016/BooksAll.2016.part19.utf8:142846879:783 |
| Source | Library of Congress |
| Download Link | /show-records/marc_loc_2016/BooksAll.2016.part19.utf8:142846879:783?format=raw |
LEADER: 00783cam a2200265 a 4500
001 89116745
003 DLC
005 20010808122053.0
008 890223s1988 ne a b 001 0 eng
010 $a 89116745
020 $a044442878X
040 $aDLC$cDLC$dDLC
050 00 $aTS695$b.D88 1988
082 00 $a671.7/35$220
100 1 $aDuval, Pierre.
245 10 $aHigh vacuum production in the microelectronics industry /$cPierre Duval.
260 $aAmsterdam ;$aNew York :$bElsevier,$c1988.
300 $axiii, 222 p. :$bill. ;$c25 cm.
440 0 $aPlasma technology ;$v2
500 $a"ALCATEL."
500 $aIncludes index.
504 $aBibliography: p. 163-167.
650 0 $aVapor-plating.
650 0 $aVacuum microelectronics.
710 2 $aAlcatel Vacuum Technology (Firm)