| Record ID | marc_loc_2016/BooksAll.2016.part20.utf8:40748917:876 |
| Source | Library of Congress |
| Download Link | /show-records/marc_loc_2016/BooksAll.2016.part20.utf8:40748917:876?format=raw |
LEADER: 00876pam a2200253 a 4500
001 90012865
003 DLC
005 19940805134409.2
008 900723s1990 gw a b 00110 eng
010 $a 90012865
020 $a3527268847 (Weinheim : alk. paper)
020 $a0895735059 (New York : alk. paper)
040 $aDLC$cDLC$dDLC
050 00 $aTA417.23$b.F83 1990
082 00 $a620.1/127$220
100 10 $aFuchs, Ekkehard.
245 10 $aParticle beam microanalysis :$bfundamentals, methods, and applications /$cE. Fuchs, H. Oppolzer, H. Rehme.
260 0 $aWeinheim, F.R.G. ;$aNew York, NY, USA :$bVCH,$c1990.
300 $axviii, 507 p. :$bill. ;$c25 cm.
504 $aIncludes bibliographical references and index.
650 0 $aMaterials$xMicroscopy.
650 0 $aElectron microscopy$xIndustrial applications.
700 10 $aOppolzer, Helmut.
700 10 $aRehme, Hans.