| Record ID | marc_loc_2016/BooksAll.2016.part25.utf8:71293025:745 |
| Source | Library of Congress |
| Download Link | /show-records/marc_loc_2016/BooksAll.2016.part25.utf8:71293025:745?format=raw |
LEADER: 00745cam a2200253 a 4500
001 96000210
003 DLC
005 19980908145744.0
008 960123s1996 nyua 001 0 eng
010 $a 96000210
020 $a0827361246
040 $aDLC$cDLC$dDLC
050 00 $aZ252.5.O5$bD44 1996
082 00 $a686.2/315$220
100 1 $aDennis, Ervin A.
245 10 $aLithographic technology in transition /$cErvin A. Dennis, Olusegun Odesina, Daniel G. Wilson.
250 $a1st ed.
260 $aAlbany, N.Y. :$bDelmar Publishers,$c1996.
300 $a626 p. :$bill. (some col.) ;$c28 cm.
500 $aIncludes index.
650 0 $aOffset lithography.
650 0 $aLithography.
700 1 $aOdesina, Olusegun.
700 1 $aWilson, Daniel G.