| Record ID | marc_loc_2016/BooksAll.2016.part25.utf8:7357315:1267 |
| Source | Library of Congress |
| Download Link | /show-records/marc_loc_2016/BooksAll.2016.part25.utf8:7357315:1267?format=raw |
LEADER: 01267nam a2200277 a 4500
001 95236474
003 DLC
005 19960305080427.7
008 951221s1995 caua b 100 0 eng
010 $a 95236474
020 $a0819420093
040 $aDLC$cDLC
050 00 $aTK7871.85$b.T36 1995
082 00 $a621.3815/31$220
245 00 $aTechnologies for microlithography manufacturing :$b11 July 1995, San Francisco, California /$cWillard Conley ... [et al.], instructors/authors ; sponsored by SEMI, Semiconductor Equipment and Materials International, SPIE, the International Society for Optical Engineering.
260 $aMountain View, Calif., USA :$bSemiconductor Equipment and Materials International ;$aBellingham, Wash. :$bThe Society,$cc1995.
300 $av, 224 p. :$bill. ;$c28 cm.
440 0 $aTechnology tutorial series ;$vv. 4
504 $aIncludes bibliographical references.
650 0 $aSemiconductors$xDesign and construction$xCongresses.
650 0 $aMicrolithography$xCongresses.
650 0 $aManufacturing processes$xCongresses.
650 0 $aMasks (Electronics)$xCongresses.
700 1 $aConley, Willard.
710 2 $aSemiconductor Equipment and Materials International.
710 2 $aSociety of Photo-Optical Instrumentation Engineers.