| Record ID | marc_loc_2016/BooksAll.2016.part29.utf8:206003599:1069 |
| Source | Library of Congress |
| Download Link | /show-records/marc_loc_2016/BooksAll.2016.part29.utf8:206003599:1069?format=raw |
LEADER: 01069cam a22002654a 4500
001 2002069397
003 DLC
005 20041112205457.0
008 020418r20021951mdua 000 0aeng
010 $a 2002069397
020 $a0801872111 (alk. paper)
040 $aDLC$cDLC$dDLC
042 $apcc
050 00 $aTS140.L63$bA36 2002
082 00 $a745.2/092$aB$221
100 1 $aLoewy, Raymond,$d1893-1986.
245 10 $aNever leave well enough alone /$cby Raymond Loewy with a new introduction by Glenn Porter.
260 $aBaltimore :$bJohns Hopkins University Press,$c2002.
300 $axxiv, 377 p. :$bill. ;$c19 cm.
500 $aOriginally published in 1951 by Simon and Schuster, New York.
600 10 $aLoewy, Raymond,$d1893-1986.
650 0 $aIndustrial designers$vBiography.
856 42 $3Contributor biographical information$uhttp://www.loc.gov/catdir/bios/jhu051/2002069397.html
856 42 $3Publisher description$uhttp://www.loc.gov/catdir/description/jhu051/2002069397.html
856 41 $3Table of contents$uhttp://www.loc.gov/catdir/toc/fy036/2002069397.html