| Record ID | marc_loc_2016/BooksAll.2016.part32.utf8:191347543:1396 |
| Source | Library of Congress |
| Download Link | /show-records/marc_loc_2016/BooksAll.2016.part32.utf8:191347543:1396?format=raw |
LEADER: 01396cam a22003134a 4500
001 2005282418
003 DLC
005 20060302083233.0
008 050929s2005 sz a b 101 0 eng
010 $a 2005282418
020 $a390845106X (pbk.)
040 $aDLC$cDLC$dDLC
042 $apcc
050 00 $aTK7871.85$b. I58435 2004
082 00 $a621.3815/2$222
111 2 $aInternational Symposium on Ultra Clean Processing of Silicon Surfaces$n(7th :$d2004 :$cBrussels, Belgium)
245 10 $aUltra clean processing of silicon surfaces VII :$bUCPSS 2004 : proceedings of the 7th International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS) hled in Brussels, Belgium, September 20-22, 2004 /$cedited by Marc Heyns, Marc Meuris, and Paul Mertens.
260 $aUetikon-Zuerich, Switzerland ;$aEnfield, NH :$bTrans Tech Publications,$cc2005.
300 $axiv, 396 p. :$bill. ;$c25 cm.
490 1 $aSolid state phenomena
504 $aIncludes bibliographical references and index.
650 0 $aSemiconductor wafers$xCleaning$vCongresses.
650 0 $aSilicon$xSurfaces$xCongresses.
650 0 $aContamination control$xCongresses.
700 1 $aHeyns, Marc.
700 1 $aMeuris, Marc.
700 1 $aMertens, Paul.
830 0 $aDiffusion and defect data.$nPt. B,$pSolid state phenomena.
856 41 $3Table of contents$uhttp://www.loc.gov/catdir/toc/fy0604/2005282418.html