| Record ID | marc_loc_2016/BooksAll.2016.part36.utf8:78005455:790 |
| Source | Library of Congress |
| Download Link | /show-records/marc_loc_2016/BooksAll.2016.part36.utf8:78005455:790?format=raw |
LEADER: 00790cam a22002414a 4500
001 2008900091
003 DLC
005 20140402102703.0
008 080322s2008 ctu b 001 0 eng
010 $a 2008900091
020 $a9780981466347
040 $aDLC$cDLC$dDLC
050 00 $aTS695$b.S5385 2008
100 1 $aSherman, Arthur,$d1931-
245 10 $aAtomic layer deposition for nanotechnology :$ban enabling process for nanotechnology fabrication /$cby Arthur Sherman.
260 $aIvoryton, Conn. :$bIvoryton Press,$cc2008.
300 $axv, 239 p. :$bill. ;$c24 cm.
504 $aIncludes bibliographical references and index.
650 0 $aChemical vapor deposition.
650 0 $aEpitaxy.
650 0 $aMicroelectronics.
650 0 $aNanotechnology.
650 0 $aAtomic layer deposition.