| Record ID | marc_loc_2016/BooksAll.2016.part37.utf8:108276200:1231 |
| Source | Library of Congress |
| Download Link | /show-records/marc_loc_2016/BooksAll.2016.part37.utf8:108276200:1231?format=raw |
LEADER: 01231cam a22003137a 4500
001 2009941699
003 DLC
005 20120211083111.0
008 091117s2010 nyua b 001 0 eng
010 $a 2009941699
020 $a9781441906632 (hbk. : alk. paper)
020 $a9781441906649 (ebk.)
035 $a(OCoLC)ocn401159450
040 $aUKM$beng$cUKM$dBTCTA$dYDXCP$dBWX$dAFU$dC#P$dDEBBG$dOCL$dUKMGB$dDLC
042 $alccopycat
050 00 $aTK7871.99.M44$bT44 2010
082 04 $a621.38152$222
245 00 $aThin film metal-oxides :$bfundamentals and applications in electronics and energy /$cShriram Ramanathan, editor.
260 $aNew York :$bSpringer,$cc2010.
300 $axvi, 337 p. :$bill. ;$c25 cm.
504 $aIncludes bibliographical references and index.
650 0 $aMetal oxide semiconductors.
650 0 $aThin films$xElectric properties.
650 0 $aThin films$xIndustrial applications.
650 07 $aDünne Schicht.$2swd
650 07 $aMetalloxide.$2swd
655 7 $aAufsatzsammlung.$2swd
700 1 $aRamanathan, Shriram.
856 41 $3Table of contents$uhttp://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&doc_number=018617146&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA