| Record ID | marc_loc_2016/BooksAll.2016.part40.utf8:216398851:1388 |
| Source | Library of Congress |
| Download Link | /show-records/marc_loc_2016/BooksAll.2016.part40.utf8:216398851:1388?format=raw |
LEADER: 01388cam a2200373 i 4500
001 2013016209
003 DLC
005 20140402104532.0
008 130422t20132013maua b 001 0 eng
010 $a 2013016209
020 $a9781118062777 (cloth : alk. paper)
040 $aDLC$beng$cDLC$erda$dDLC
042 $apcc
050 00 $aTS695$b.K33 2013
082 00 $a620/.5$223
100 1 $aKääriäinen, Tommi.
245 10 $aAtomic layer deposition :$bprinciples, characteristics, and nanotechnology applications /$cTommi Kääriäinen, David Cameron, Marja-Leena Kääriäinen, and Arthur Sherman.
250 $a2nd Edition
264 1 $aBeverly, MA :$bScrivener Publishing,$c[2013]
264 4 $c©2013
300 $axv, 253 pages :$billustrations ;$c25 cm
336 $atext$2rdacontent
337 $aunmediated$2rdamedia
338 $avolume$2rdacarrier
504 $aIncludes bibliographical references and index.
650 0 $aChemical vapor deposition.
650 0 $aEpitaxy.
650 0 $aMicroelectronics.
650 0 $aNanotechnology.
650 0 $aAtomic layer deposition.
700 1 $aCameron, David,$d1949-
700 1 $aKääriäinen, Marja-Leena.
700 1 $aSherman, Arthur,$d1931-
776 08 $iOnline version:$aKääriäinen, Tommi.$tAtomic layer deposition$dHoboken, New Jersey : John Wiley & Sons, [2013]$z9781118747421$w(DLC) 2013016681