| Record ID | marc_loc_2016/BooksAll.2016.part40.utf8:217075445:1609 |
| Source | Library of Congress |
| Download Link | /show-records/marc_loc_2016/BooksAll.2016.part40.utf8:217075445:1609?format=raw |
LEADER: 01609cam a2200421 i 4500
001 2013016681
003 DLC
005 20150317082119.0
006 m |o d |
007 cr_|||||||||||
008 130423s2013 mau ob 001 0 eng
010 $a 2013016681
020 $a9781118747384 (epub)
020 $a9781118747421 (pdf)
020 $a9781118747346 ( mobi)
020 $z9781118062777 (cloth : alk. paper)
040 $aDLC$beng$cDLC$erda$dDLC
042 $apcc
050 00 $aTS695
082 00 $a620/.5$223
100 1 $aKääriäinen, Tommi.
245 10 $aAtomic layer deposition :$bprinciples, characteristics, and nanotechnology applications /$cTommi Kääriäinen, David Cameron, Marja-Leena Kääriäinen, and Arthur Sherman.
250 $a2nd Edition.
264 1 $aSalem, Massachusetts :$bScrivener Publishing, LLC ;$aHoboken, New Jersey :$bWiley,$c[2013]
300 $a1 online resource.
336 $atext$2rdacontent
337 $acomputer$2rdamedia
338 $aonline resource$2rdacarrier
504 $aIncludes bibliographical references and index.
588 $aDescription based on print version record and CIP data provided by publisher.
650 0 $aChemical vapor deposition.
650 0 $aEpitaxy.
650 0 $aMicroelectronics.
650 0 $aNanotechnology.
700 1 $aCameron, David,$d1949-
700 1 $aKääriäinen, Marja-Leena.
700 1 $aSherman, Arthur,$d1931-
776 08 $iPrint version:$aKääriäinen, Tommi.$tAtomic layer deposition$dHoboken, New Jersey : John Wiley & Sons, [2013]$z9781118062777$w(DLC) 2013016209