| Record ID | marc_loc_updates/v36.i11.records.utf8:13151376:1626 |
| Source | Library of Congress |
| Download Link | /show-records/marc_loc_updates/v36.i11.records.utf8:13151376:1626?format=raw |
LEADER: 01626cam a22003377a 4500
001 2006935319
003 DLC
005 20080311115407.0
008 060925s2006 nyua b 101 0 eng d
010 $a 2006935319
020 $a9780735403659
020 $a0735403651
035 $a(CStRLIN)NYPGR77535657-B
035 $a(OCoLC)77535657
040 $aGZN$cGZN$dBAKER$dYDXCP$dIQU$dNYP$dUtOrBLW$dDLC
042 $alccopycat
050 00 $aQC702.7.I55$bI577 2006
082 00 $a621.3815/2$222
111 2 $aInternational Conference on Ion Implantation Technology$n(16th :$d2006 :$cMarseille, France)
245 10 $aIon implantation technology :$b16th International Conference on Ion Implantation Technology, IIT 2006, Marseille, France, 11-16 June 2006 /$ceditors, Karen J. Kirkby ... [et al.].
246 30 $aIIT 2006
260 $aMelville, N.Y. :$bAmerican Institute of Physics,$cc2006.
300 $axvii, 664 p. :$bill. ;$c28 cm.
490 1 $aAIP conference proceedings,$x0094-243X ;$vv. 866
504 $aIncludes bibliographical references and index.
505 0 $aDoping processes in semiconductors -- Cluster implantation in doping -- PIII and plasma doping -- Materials : novel techniques and applications -- Implant technology -- Implant technology (materials) -- Process control & yield -- Process control & yield (metrology) -- Materials.
650 0 $aSemiconductors$vCongresses.
650 0 $aSemiconductor doping$vCongresses.
700 1 $aKirkby, Karen J.
830 0 $aAIP conference proceedings ;$vno. 866.
856 42 $3Publisher description$uhttp://www.loc.gov/catdir/enhancements/fy0825/2006935319-d.html