| Record ID | marc_loc_updates/v36.i11.records.utf8:5831438:1145 |
| Source | Library of Congress |
| Download Link | /show-records/marc_loc_updates/v36.i11.records.utf8:5831438:1145?format=raw |
LEADER: 01145cam a22002774a 4500
001 2002072962
003 DLC
005 20080311070141.0
008 020528s2002 ne a b 101 0 eng
010 $a 2002072962
020 $a1402005245 (alk. paper)
040 $aDLC$cDLC$dDLC
042 $apcc
050 00 $aTA418.9.T45$bC47 2002
082 00 $a621.3815/2$221
245 00 $aChemical physics of thin film deposition processes for micro- and nano-technologies /$cedited by Yves Pauleau.
260 $aDordrecht ;$aBoston :$bKluwer Academic Publishers,$cc2002.
300 $axiii, 363 p. :$bill. ;$c25 cm.
440 0 $aNATO science series.$nSeries II,$pMathematics, physics, and chemistry ;$vv. 55
500 $a"Published in cooperation with NATO Scientific Affairs Division."
504 $aIncludes bibliographical references and index.
650 0 $aThin films$vCongresses.
650 0 $aNanotechnology$vCongresses.
700 1 $aPauleau, Y.
856 42 $3Publisher description$uhttp://www.loc.gov/catdir/enhancements/fy0822/2002072962-d.html
856 41 $3Table of contents only$uhttp://www.loc.gov/catdir/enhancements/fy0822/2002072962-t.html