| Record ID | marc_loc_updates/v37.i35.records.utf8:54434278:988 |
| Source | Library of Congress |
| Download Link | /show-records/marc_loc_updates/v37.i35.records.utf8:54434278:988?format=raw |
LEADER: 00988cam a2200289 a 4500
001 2008018045
003 DLC
005 20090831132143.0
008 080421s2009 waua b 001 0 eng
010 $a 2008018045
020 $a9780819469649 (SPIE)
020 $a0819469645 (SPIE)
020 $a9780470471555 (Wiley)
020 $a0470471557 (Wiley)
035 $a(OCoLC)ocn226308133
040 $aDLC$cDLC$dYDXCP$dBTCTA$dC#P$dOCLCQ$dDLC
050 04 $aQC459$b.E98 2009
082 00 $a621.3815$222
245 00 $aEUV lithography /$cVivek Bakshi, editor.
260 $aBellingham, Wash. :$bSPIE Press ;$aHoboken, NJ :$bJohn Wiley,$cc2009.
300 $axxvii, 673 p. :$bill. ;$c27 cm.
504 $aIncludes bibliographical references and index.
650 0 $aUltraviolet radiation$xIndustrial applications.
650 0 $aPhotolithography.
650 0 $aOptical coatings.
700 1 $aBakshi, Vivek.
856 41 $3Table of contents only$uhttp://www.loc.gov/catdir/toc/ecip0816/2008018045.html