Record ID | marc_loc_updates/v37.i38.records.utf8:14719553:1388 |
Source | Library of Congress |
Download Link | /show-records/marc_loc_updates/v37.i38.records.utf8:14719553:1388?format=raw |
LEADER: 01388cam a22003374a 4500
001 99460336
003 DLC
005 20090915150253.0
008 991122s1999 nyua b 101 0 eng
010 $a 99460336
020 $a1563969041
040 $aDLC$cDLC$dDLC
050 00 $aTK7871.85$b.S773 1999
082 00 $a621.3815$222
245 00 $aStress induced phenomena in metallization :$bfifth international workshop, Stuttgart, Germany, June, 1999 /$ceditors, Oliver Kraft ... [et al.].
260 $aMelville, N.Y. :$bAmerican Institute of Physics,$cc1999.
300 $aix, 318 p. :$bill. ;$c25 cm.
490 1 $aAIP conference proceedings ;$v491
504 $aIncludes bibliographical references and index.
650 0 $aIntegrated circuits$xDefects$xCongresses.
650 0 $aThin film devices$xDefects$xCongresses.
650 0 $aElectrodiffusion$xCongresses.
650 0 $aMetallic films$xCongresses.
650 0 $aElectrochemical metallizing$xCongresses.
650 0 $aAluminum films$xCongresses.
650 0 $aSemiconductors$xDefects$xCongresses.
650 0 $aLiquid crystal devices$xDefects$xCongresses.
650 0 $aAcoustic surface wave devices$xDefects$xCongresses.
700 1 $aKraft, Oliver.
711 2 $aInternational Workshop on Stress-Induced Phenomena in Metallization$n(5th :$d1999 :$cStuttgart, Germany)
830 0 $aAIP conference proceedings ;$vno. 491.